Presentation | 2017-05-25 Fabrication of n-type AlOx thin films by drop photochemical deposition Masanari Umemura, Masaya Ichimura, |
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PDF Download Page | PDF download Page Link |
Abstract(in Japanese) | (See Japanese page) |
Abstract(in English) | AlOx is transparent for visible rays because of its large bandgap, and stable chemically and thermally. We fabricated AlOx thin films by drop photochemical deposition (d-PCD), which was performed by dropping solution on substrate and irradiating UV light. We found a possibility that the films have oxygen-deficiency defects, which can enhance electrical conductivity. Thus, we measured electrical properties of the films. Theresults showed that the filmsy have n-type electrical conductivity. |
Keyword(in Japanese) | (See Japanese page) |
Keyword(in English) | AlOx / oxygen-deficiency defects / electrical conductivity / n-type / PCD |
Paper # | ED2017-18,CPM2017-4,SDM2017-12 |
Date of Issue | 2017-05-18 (ED, CPM, SDM) |
Conference Information | |
Committee | SDM / ED / CPM |
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Conference Date | 2017/5/25(2days) |
Place (in Japanese) | (See Japanese page) |
Place (in English) | VBL, Nagoya University |
Topics (in Japanese) | (See Japanese page) |
Topics (in English) | |
Chair | Tatsuya Kunikiyo(Renesas) / Koichi Maezawa(Univ. of Toyama) / Satoru Noge(Numazu National College of Tech.) |
Vice Chair | Takahiro Shinada(Tohoku Univ.) / Kunio Tsuda(Toshiba) / Fumihiko Hirose(Yamagata Univ.) |
Secretary | Takahiro Shinada(Tohoku Univ.) / Kunio Tsuda(Renesas) / Fumihiko Hirose(JAIST) |
Assistant | Hiroya Ikeda(Shizuoka Univ.) / Masataka Higashiwaki(NICT) / Toshiyuki Oishi(Saga Univ.) / Takashi Sakamoto(NTT) / Yuichi Nakamura(Toyohashi Univ. of Tech.) |
Paper Information | |
Registration To | Technical Committee on Silicon Device and Materials / Technical Committee on Electron Devices / Technical Committee on Component Parts and Materials |
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Language | JPN |
Title (in Japanese) | (See Japanese page) |
Sub Title (in Japanese) | (See Japanese page) |
Title (in English) | Fabrication of n-type AlOx thin films by drop photochemical deposition |
Sub Title (in English) | |
Keyword(1) | AlOx |
Keyword(2) | oxygen-deficiency defects |
Keyword(3) | electrical conductivity |
Keyword(4) | n-type |
Keyword(5) | PCD |
Keyword(6) | |
Keyword(7) | |
1st Author's Name | Masanari Umemura |
1st Author's Affiliation | Nagoya Institute of Technology(NITech) |
2nd Author's Name | Masaya Ichimura |
2nd Author's Affiliation | Nagoya Institute of Technology(NITech) |
Date | 2017-05-25 |
Paper # | ED2017-18,CPM2017-4,SDM2017-12 |
Volume (vol) | vol.117 |
Number (no) | ED-58,CPM-59,SDM-60 |
Page | pp.pp.17-22(ED), pp.17-22(CPM), pp.17-22(SDM), |
#Pages | 6 |
Date of Issue | 2017-05-18 (ED, CPM, SDM) |