| Presentation | 2017-05-25 Fabrication of n-type AlOx thin films by drop photochemical deposition Masanari Umemura, Masaya Ichimura, |
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| PDF Download Page |  PDF download Page Link |
| Abstract(in Japanese) | (See Japanese page) |
| Abstract(in English) | AlOx is transparent for visible rays because of its large bandgap, and stable chemically and thermally. We fabricated AlOx thin films by drop photochemical deposition (d-PCD), which was performed by dropping solution on substrate and irradiating UV light. We found a possibility that the films have oxygen-deficiency defects, which can enhance electrical conductivity. Thus, we measured electrical properties of the films. Theresults showed that the filmsy have n-type electrical conductivity. |
| Keyword(in Japanese) | (See Japanese page) |
| Keyword(in English) | AlOx / oxygen-deficiency defects / electrical conductivity / n-type / PCD |
| Paper # | ED2017-18,CPM2017-4,SDM2017-12 |
| Date of Issue | 2017-05-18 (ED, CPM, SDM) |
| Conference Information | |
| Committee | SDM / ED / CPM |
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| Conference Date | 2017/5/25(2days) |
| Place (in Japanese) | (See Japanese page) |
| Place (in English) | VBL, Nagoya University |
| Topics (in Japanese) | (See Japanese page) |
| Topics (in English) | |
| Chair | Tatsuya Kunikiyo(Renesas) / Koichi Maezawa(Univ. of Toyama) / Satoru Noge(Numazu National College of Tech.) |
| Vice Chair | Takahiro Shinada(Tohoku Univ.) / Kunio Tsuda(Toshiba) / Fumihiko Hirose(Yamagata Univ.) |
| Secretary | Takahiro Shinada(Tohoku Univ.) / Kunio Tsuda(Renesas) / Fumihiko Hirose(JAIST) |
| Assistant | Hiroya Ikeda(Shizuoka Univ.) / Masataka Higashiwaki(NICT) / Toshiyuki Oishi(Saga Univ.) / Takashi Sakamoto(NTT) / Yuichi Nakamura(Toyohashi Univ. of Tech.) |
| Paper Information | |
| Registration To | Technical Committee on Silicon Device and Materials / Technical Committee on Electron Devices / Technical Committee on Component Parts and Materials |
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| Language | JPN |
| Title (in Japanese) | (See Japanese page) |
| Sub Title (in Japanese) | (See Japanese page) |
| Title (in English) | Fabrication of n-type AlOx thin films by drop photochemical deposition |
| Sub Title (in English) | |
| Keyword(1) | AlOx |
| Keyword(2) | oxygen-deficiency defects |
| Keyword(3) | electrical conductivity |
| Keyword(4) | n-type |
| Keyword(5) | PCD |
| Keyword(6) | |
| Keyword(7) | |
| 1st Author's Name | Masanari Umemura |
| 1st Author's Affiliation | Nagoya Institute of Technology(NITech) |
| 2nd Author's Name | Masaya Ichimura |
| 2nd Author's Affiliation | Nagoya Institute of Technology(NITech) |
| Date | 2017-05-25 |
| Paper # | ED2017-18,CPM2017-4,SDM2017-12 |
| Volume (vol) | vol.117 |
| Number (no) | ED-58,CPM-59,SDM-60 |
| Page | pp.pp.17-22(ED), pp.17-22(CPM), pp.17-22(SDM), |
| #Pages | 6 |
| Date of Issue | 2017-05-18 (ED, CPM, SDM) |