Presentation | 2017-05-25 Electrochemical deposition of Cu-doped p-type Fe-O thin films Satoshi Kobayashi, Masaya Ichimura, |
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PDF Download Page | PDF download Page Link |
Abstract(in Japanese) | (See Japanese page) |
Abstract(in English) | |
Keyword(in Japanese) | (See Japanese page) |
Keyword(in English) | |
Paper # | ED2017-19,CPM2017-5,SDM2017-13 |
Date of Issue | 2017-05-18 (ED, CPM, SDM) |
Conference Information | |
Committee | SDM / ED / CPM |
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Conference Date | 2017/5/25(2days) |
Place (in Japanese) | (See Japanese page) |
Place (in English) | VBL, Nagoya University |
Topics (in Japanese) | (See Japanese page) |
Topics (in English) | |
Chair | Tatsuya Kunikiyo(Renesas) / Koichi Maezawa(Univ. of Toyama) / Satoru Noge(Numazu National College of Tech.) |
Vice Chair | Takahiro Shinada(Tohoku Univ.) / Kunio Tsuda(Toshiba) / Fumihiko Hirose(Yamagata Univ.) |
Secretary | Takahiro Shinada(Tohoku Univ.) / Kunio Tsuda(Renesas) / Fumihiko Hirose(JAIST) |
Assistant | Hiroya Ikeda(Shizuoka Univ.) / Masataka Higashiwaki(NICT) / Toshiyuki Oishi(Saga Univ.) / Takashi Sakamoto(NTT) / Yuichi Nakamura(Toyohashi Univ. of Tech.) |
Paper Information | |
Registration To | Technical Committee on Silicon Device and Materials / Technical Committee on Electron Devices / Technical Committee on Component Parts and Materials |
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Language | JPN |
Title (in Japanese) | (See Japanese page) |
Sub Title (in Japanese) | (See Japanese page) |
Title (in English) | Electrochemical deposition of Cu-doped p-type Fe-O thin films |
Sub Title (in English) | |
Keyword(1) | |
1st Author's Name | Satoshi Kobayashi |
1st Author's Affiliation | Nagoya Institute of Technology(NITech) |
2nd Author's Name | Masaya Ichimura |
2nd Author's Affiliation | Nagoya Institute of Technology(NITech) |
Date | 2017-05-25 |
Paper # | ED2017-19,CPM2017-5,SDM2017-13 |
Volume (vol) | vol.117 |
Number (no) | ED-58,CPM-59,SDM-60 |
Page | pp.pp.23-28(ED), pp.23-28(CPM), pp.23-28(SDM), |
#Pages | 6 |
Date of Issue | 2017-05-18 (ED, CPM, SDM) |