Presentation 2017-05-25
Fabrication of NiO thin film by electrochemical deposition
Miki Koyama, Masaya Ichimura,
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Abstract(in Japanese) (See Japanese page)
Abstract(in English)
Keyword(in Japanese) (See Japanese page)
Keyword(in English)
Paper # ED2017-17,CPM2017-3,SDM2017-11
Date of Issue 2017-05-18 (ED, CPM, SDM)

Conference Information
Committee SDM / ED / CPM
Conference Date 2017/5/25(2days)
Place (in Japanese) (See Japanese page)
Place (in English) VBL, Nagoya University
Topics (in Japanese) (See Japanese page)
Topics (in English)
Chair Tatsuya Kunikiyo(Renesas) / Koichi Maezawa(Univ. of Toyama) / Satoru Noge(Numazu National College of Tech.)
Vice Chair Takahiro Shinada(Tohoku Univ.) / Kunio Tsuda(Toshiba) / Fumihiko Hirose(Yamagata Univ.)
Secretary Takahiro Shinada(Tohoku Univ.) / Kunio Tsuda(Renesas) / Fumihiko Hirose(JAIST)
Assistant Hiroya Ikeda(Shizuoka Univ.) / Masataka Higashiwaki(NICT) / Toshiyuki Oishi(Saga Univ.) / Takashi Sakamoto(NTT) / Yuichi Nakamura(Toyohashi Univ. of Tech.)

Paper Information
Registration To Technical Committee on Silicon Device and Materials / Technical Committee on Electron Devices / Technical Committee on Component Parts and Materials
Language JPN
Title (in Japanese) (See Japanese page)
Sub Title (in Japanese) (See Japanese page)
Title (in English) Fabrication of NiO thin film by electrochemical deposition
Sub Title (in English)
Keyword(1)
1st Author's Name Miki Koyama
1st Author's Affiliation Nagoya Institute of Technology(NITech)
2nd Author's Name Masaya Ichimura
2nd Author's Affiliation Nagoya Institute of Technology(NITech)
Date 2017-05-25
Paper # ED2017-17,CPM2017-3,SDM2017-11
Volume (vol) vol.117
Number (no) ED-58,CPM-59,SDM-60
Page pp.pp.11-16(ED), pp.11-16(CPM), pp.11-16(SDM),
#Pages 6
Date of Issue 2017-05-18 (ED, CPM, SDM)