Presentation 2017-04-21
Thermal-Plasma-Jet Crystallization of Amorphous Silicon Films on Flexible Glass Substrate Using Rotation Stage
Wataru Nakano, Tatsuki Hieda, Hiroaki Hanafusa, Seiichiro Higashi,
PDF Download Page PDF download Page Link
Abstract(in Japanese) (See Japanese page)
Abstract(in English)
Keyword(in Japanese) (See Japanese page)
Keyword(in English)
Paper #
Date of Issue

Conference Information
Committee OME / SDM
Conference Date 2017/4/20(2days)
Place (in Japanese) (See Japanese page)
Place (in English) Tatsugochou Shougaigakushuu Center
Topics (in Japanese) (See Japanese page)
Topics (in English) Organic molecular devices, silicon device, biotechnology, thin film device, novel material, evaluation method, etc
Chair Naoki Matsuda(AIST) / Tatsuya Kunikiyo(Renesas)
Vice Chair Tatsuo Mori(Aichi Inst. of Tech.) / Takahiro Shinada(Tohoku Univ.)
Secretary Tatsuo Mori(NTT) / Takahiro Shinada(Univ. of Tokyo)
Assistant Hirotake Kajii(Osaka Univ.) / Dai Taguchi(Tokyo Inst. of Tech.) / Hiroya Ikeda(Shizuoka Univ.)

Paper Information
Registration To Technical Committee on Organic Molecular Electronics / Technical Committee on Silicon Device and Materials
Language JPN
Title (in Japanese) (See Japanese page)
Sub Title (in Japanese) (See Japanese page)
Title (in English) Thermal-Plasma-Jet Crystallization of Amorphous Silicon Films on Flexible Glass Substrate Using Rotation Stage
Sub Title (in English)
Keyword(1)
1st Author's Name Wataru Nakano
1st Author's Affiliation Hiroshima University(Hiroshima Univ.)
2nd Author's Name Tatsuki Hieda
2nd Author's Affiliation Hiroshima University(Hiroshima Univ.)
3rd Author's Name Hiroaki Hanafusa
3rd Author's Affiliation Hiroshima University(Hiroshima Univ.)
4th Author's Name Seiichiro Higashi
4th Author's Affiliation Hiroshima University(Hiroshima Univ.)
Date 2017-04-21
Paper #
Volume (vol) vol.117
Number (no) SDM-7,OME-8
Page pp.pp.-(),
#Pages
Date of Issue