Presentation | 2017-02-24 Fabrication of Zinc Oxide-based Thin Films Transistors by a Solution Process and a Direct Patterning of Oxide Thin Films by a Thermal Nanoimprint Method Fumiya Kimura, Alhanaki Abdullah, Yi Sun, Shota Sasaki, Koki Nagayama, Masatoshi Koyama, Toshihiko Maemoto, Shigehiko Sasa, |
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PDF Download Page | PDF download Page Link |
Abstract(in Japanese) | (See Japanese page) |
Abstract(in English) | Zinc oxide (ZnO) is transparent semiconductor material in visible light wavelength because it has band gap energy of 3.37 eV. ZnO is also one of the most attracted attention semiconductor material for the next generation display TFTs. ZnO films and its TFT applications have high adaptability to various fabrication processes. In this study, we report on fabrication and characterization of AZO multi-layer thin-film transistors using AZO thin film buffers by a solution method toward the development of high-performance TFT. On the other hand, nanoimprint lithography is attracting much interest from many industrial fields because it can provide various nanostructures. Imprinted pattern with an AZO gel thin film were obtained by a thermal nanoimprint method. These results also were reported in detail for the direct patterning by a thermal nanoimprint process. |
Keyword(in Japanese) | (See Japanese page) |
Keyword(in English) | Solution Method / Zinc Oxide / Thin Film Transistors / Nanoimprint Method |
Paper # | ED2016-132,SDM2016-149 |
Date of Issue | 2017-02-17 (ED, SDM) |
Conference Information | |
Committee | ED / SDM |
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Conference Date | 2017/2/24(1days) |
Place (in Japanese) | (See Japanese page) |
Place (in English) | Centennial Hall, Hokkaido Univ. |
Topics (in Japanese) | (See Japanese page) |
Topics (in English) | Functional nanodevices and related technologies |
Chair | Koichi Maezawa(Univ. of Toyama) / Tatsuya Kunikiyo(Renesas) |
Vice Chair | Kunio Tsuda(Toshiba) / Takahiro Shinada(Tohoku Univ.) |
Secretary | Kunio Tsuda(JAIST) / Takahiro Shinada(New JRC) |
Assistant | Masataka Higashiwaki(NICT) / Toshiyuki Oishi(Saga Univ.) / Hiroya Ikeda(Shizuoka Univ.) |
Paper Information | |
Registration To | Technical Committee on Electron Devices / Technical Committee on Silicon Device and Materials |
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Language | JPN |
Title (in Japanese) | (See Japanese page) |
Sub Title (in Japanese) | (See Japanese page) |
Title (in English) | Fabrication of Zinc Oxide-based Thin Films Transistors by a Solution Process and a Direct Patterning of Oxide Thin Films by a Thermal Nanoimprint Method |
Sub Title (in English) | |
Keyword(1) | Solution Method |
Keyword(2) | Zinc Oxide |
Keyword(3) | Thin Film Transistors |
Keyword(4) | Nanoimprint Method |
1st Author's Name | Fumiya Kimura |
1st Author's Affiliation | Osaka Institute of Technology(OIT) |
2nd Author's Name | Alhanaki Abdullah |
2nd Author's Affiliation | Osaka Institute of Technology(OIT) |
3rd Author's Name | Yi Sun |
3rd Author's Affiliation | Osaka Institute of Technology(OIT) |
4th Author's Name | Shota Sasaki |
4th Author's Affiliation | Osaka Institute of Technology(OIT) |
5th Author's Name | Koki Nagayama |
5th Author's Affiliation | Osaka Institute of Technology(OIT) |
6th Author's Name | Masatoshi Koyama |
6th Author's Affiliation | Osaka Institute of Technology(OIT) |
7th Author's Name | Toshihiko Maemoto |
7th Author's Affiliation | Osaka Institute of Technology(OIT) |
8th Author's Name | Shigehiko Sasa |
8th Author's Affiliation | Osaka Institute of Technology(OIT) |
Date | 2017-02-24 |
Paper # | ED2016-132,SDM2016-149 |
Volume (vol) | vol.116 |
Number (no) | ED-471,SDM-472 |
Page | pp.pp.13-16(ED), pp.13-16(SDM), |
#Pages | 4 |
Date of Issue | 2017-02-17 (ED, SDM) |