Presentation 2017-01-30
[Invited Talk] Fully Coupled 3-D Device Simulation of Negative Capacitance FinFETs for Sub 10 nm Integration
Hiroyuki Ota, Tsutomu Ikegami, Junichi Hattori, Koichi Fukuda, Shinji Migita, Akira Toriumi,
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Abstract(in Japanese) (See Japanese page)
Abstract(in English) Subthreshold operation of negative capacitance FinFETs (NC-FinFETs) at sub 10 nm gate length are analyzed with a newly developed technology computer-aided design (TCAD) simulation. This simulation fully couples the Landau-Khalatnikov (L-K) equation with the physical equations for FinFETs in 3-D. It reveals an excellent immunity against short channel effects in NC-FinFETs owing to NC-enhancement by the gate-to-drain coupling, for the first time. NC-FinFETs with a gate length of 10 nm are projected to operate with more than 26 times energy-efficiency of conventional FinFETs.
Keyword(in Japanese) (See Japanese page)
Keyword(in English) ferroelectric / negative capacitance / technology computer-aided design / low power / subthreshold / steep
Paper # SDM2016-133
Date of Issue 2017-01-23 (SDM)

Conference Information
Committee SDM
Conference Date 2017/1/30(1days)
Place (in Japanese) (See Japanese page)
Place (in English) Kikai-Shinko-Kaikan Bldg.
Topics (in Japanese) (See Japanese page)
Topics (in English)
Chair Tatsuya Kunikiyo(Renesas)
Vice Chair Takahiro Shinada(Tohoku Univ.)
Secretary Takahiro Shinada(Tohoku Univ.)
Assistant Hiroya Ikeda(Shizuoka Univ.)

Paper Information
Registration To Technical Committee on Silicon Device and Materials
Language JPN
Title (in Japanese) (See Japanese page)
Sub Title (in Japanese) (See Japanese page)
Title (in English) [Invited Talk] Fully Coupled 3-D Device Simulation of Negative Capacitance FinFETs for Sub 10 nm Integration
Sub Title (in English)
Keyword(1) ferroelectric
Keyword(2) negative capacitance
Keyword(3) technology computer-aided design
Keyword(4) low power
Keyword(5) subthreshold
Keyword(6) steep
1st Author's Name Hiroyuki Ota
1st Author's Affiliation The National Institute of Advanced Industrial Science and Technology(AIST)
2nd Author's Name Tsutomu Ikegami
2nd Author's Affiliation The National Institute of Advanced Industrial Science and Technology(AIST)
3rd Author's Name Junichi Hattori
3rd Author's Affiliation The National Institute of Advanced Industrial Science and Technology(AIST)
4th Author's Name Koichi Fukuda
4th Author's Affiliation The National Institute of Advanced Industrial Science and Technology(AIST)
5th Author's Name Shinji Migita
5th Author's Affiliation The National Institute of Advanced Industrial Science and Technology(AIST)
6th Author's Name Akira Toriumi
6th Author's Affiliation The University of Tokyo(The Univ. of Tokyo)
Date 2017-01-30
Paper # SDM2016-133
Volume (vol) vol.116
Number (no) SDM-448
Page pp.pp.13-16(SDM),
#Pages 4
Date of Issue 2017-01-23 (SDM)