Presentation | 2017-01-30 [Invited Talk] Fully Coupled 3-D Device Simulation of Negative Capacitance FinFETs for Sub 10 nm Integration Hiroyuki Ota, Tsutomu Ikegami, Junichi Hattori, Koichi Fukuda, Shinji Migita, Akira Toriumi, |
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PDF Download Page | PDF download Page Link |
Abstract(in Japanese) | (See Japanese page) |
Abstract(in English) | Subthreshold operation of negative capacitance FinFETs (NC-FinFETs) at sub 10 nm gate length are analyzed with a newly developed technology computer-aided design (TCAD) simulation. This simulation fully couples the Landau-Khalatnikov (L-K) equation with the physical equations for FinFETs in 3-D. It reveals an excellent immunity against short channel effects in NC-FinFETs owing to NC-enhancement by the gate-to-drain coupling, for the first time. NC-FinFETs with a gate length of 10 nm are projected to operate with more than 26 times energy-efficiency of conventional FinFETs. |
Keyword(in Japanese) | (See Japanese page) |
Keyword(in English) | ferroelectric / negative capacitance / technology computer-aided design / low power / subthreshold / steep |
Paper # | SDM2016-133 |
Date of Issue | 2017-01-23 (SDM) |
Conference Information | |
Committee | SDM |
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Conference Date | 2017/1/30(1days) |
Place (in Japanese) | (See Japanese page) |
Place (in English) | Kikai-Shinko-Kaikan Bldg. |
Topics (in Japanese) | (See Japanese page) |
Topics (in English) | |
Chair | Tatsuya Kunikiyo(Renesas) |
Vice Chair | Takahiro Shinada(Tohoku Univ.) |
Secretary | Takahiro Shinada(Tohoku Univ.) |
Assistant | Hiroya Ikeda(Shizuoka Univ.) |
Paper Information | |
Registration To | Technical Committee on Silicon Device and Materials |
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Language | JPN |
Title (in Japanese) | (See Japanese page) |
Sub Title (in Japanese) | (See Japanese page) |
Title (in English) | [Invited Talk] Fully Coupled 3-D Device Simulation of Negative Capacitance FinFETs for Sub 10 nm Integration |
Sub Title (in English) | |
Keyword(1) | ferroelectric |
Keyword(2) | negative capacitance |
Keyword(3) | technology computer-aided design |
Keyword(4) | low power |
Keyword(5) | subthreshold |
Keyword(6) | steep |
1st Author's Name | Hiroyuki Ota |
1st Author's Affiliation | The National Institute of Advanced Industrial Science and Technology(AIST) |
2nd Author's Name | Tsutomu Ikegami |
2nd Author's Affiliation | The National Institute of Advanced Industrial Science and Technology(AIST) |
3rd Author's Name | Junichi Hattori |
3rd Author's Affiliation | The National Institute of Advanced Industrial Science and Technology(AIST) |
4th Author's Name | Koichi Fukuda |
4th Author's Affiliation | The National Institute of Advanced Industrial Science and Technology(AIST) |
5th Author's Name | Shinji Migita |
5th Author's Affiliation | The National Institute of Advanced Industrial Science and Technology(AIST) |
6th Author's Name | Akira Toriumi |
6th Author's Affiliation | The University of Tokyo(The Univ. of Tokyo) |
Date | 2017-01-30 |
Paper # | SDM2016-133 |
Volume (vol) | vol.116 |
Number (no) | SDM-448 |
Page | pp.pp.13-16(SDM), |
#Pages | 4 |
Date of Issue | 2017-01-23 (SDM) |