Presentation | 2016-12-12 [Invited Talk] The tolerance of data retention characteristics to external stresses in metal oxide resistive random access memory Kentaro Kinoshita, |
---|---|
PDF Download Page | PDF download Page Link |
Abstract(in Japanese) | (See Japanese page) |
Abstract(in English) | |
Keyword(in Japanese) | (See Japanese page) |
Keyword(in English) | |
Paper # | EID2016-17,SDM2016-98 |
Date of Issue | 2016-12-05 (EID, SDM) |
Conference Information | |
Committee | SDM / EID |
---|---|
Conference Date | 2016/12/12(1days) |
Place (in Japanese) | (See Japanese page) |
Place (in English) | NAIST |
Topics (in Japanese) | (See Japanese page) |
Topics (in English) | Fabrication and Evaluation of Silicon Related Materials |
Chair | Tatsuya Kunikiyo(Renesas) / Tomokazu Shiga(Univ. of Electro-Comm.) |
Vice Chair | Takahiro Shinada(Tohoku Univ.) / Mutsumi Kimura(Ryukoku Univ.) / Yuko Kominami(Shizuoka Univ.) |
Secretary | Takahiro Shinada(Tohoku Univ.) / Mutsumi Kimura(Renesas) / Yuko Kominami(NTT) |
Assistant | Hiroya Ikeda(Shizuoka Univ.) / Rumiko Yamaguchi(Akita Univ.) / Hiroyuki Nitta(Japan Display) / Mitsuru Nakata(NHK) / Takashi Kojiri(ZEON) / Ryosuke Nonaka(Toshiba) |
Paper Information | |
Registration To | Technical Committee on Silicon Device and Materials / Technical Committee on Electronic Information Displays |
---|---|
Language | JPN |
Title (in Japanese) | (See Japanese page) |
Sub Title (in Japanese) | (See Japanese page) |
Title (in English) | [Invited Talk] The tolerance of data retention characteristics to external stresses in metal oxide resistive random access memory |
Sub Title (in English) | |
Keyword(1) | |
1st Author's Name | Kentaro Kinoshita |
1st Author's Affiliation | Tottori University(Tottori Univ.) |
Date | 2016-12-12 |
Paper # | EID2016-17,SDM2016-98 |
Volume (vol) | vol.116 |
Number (no) | EID-354,SDM-355 |
Page | pp.pp.37-40(EID), pp.37-40(SDM), |
#Pages | 4 |
Date of Issue | 2016-12-05 (EID, SDM) |