Presentation 2016-12-09
Sputter-deposition of inclined anisotropy film with Co/Pt atomic layer stacking
Naoki Honda, Shintaro Hinata, Shin Saito,
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Abstract(in Japanese) (See Japanese page)
Abstract(in English) Deposition of weakly inclined anisotropy film for bit-patterned media was studied. First, deposition of Co/Pt layer stacking film with high perpendicular anisotropy and saturation magnetization was investigated by room temperature co-sputtering of Co and Pt with rotating substrate holder. A film with a high perpendicular anisotropy of 1×107 erg/cm3 and saturation magnetization of 600 emu/cm3 was obtained when a high deposition Ar pressure of 4.8 Pa and 3 mono-layer stacking of Co and 2 mono-layer stacking of Pt were adopted. The obtained Co/Pt film was applied to deposit inclined anisotropy film using tilted collimator sputtering. Inclination of anisotropy axis of around 8˚ with a high perpendicular coercivity of around 5 kOe was obtained. The result suggested possibility to make a bit-patterned media for high recording densities.
Keyword(in Japanese) (See Japanese page)
Keyword(in English) Co/Pt layer stacking film / Sputter-deposition with rotating substrate holder / High Ar pressure deposition / Stacking layer thickness dependence / High magnetic anisotropy film / Inclined anisotropy film
Paper # MR2016-38
Date of Issue 2016-12-01 (MR)

Conference Information
Committee MR / ITE-MMS
Conference Date 2016/12/8(2days)
Place (in Japanese) (See Japanese page)
Place (in English) Ehime Univ.
Topics (in Japanese) (See Japanese page)
Topics (in English) Signal Processing, etc.
Chair Yoshihiro Okamoto(Ehime Univ.) / Eiichi Miyashita(NHK)
Vice Chair
Secretary (Kogakuin Univ.) / (AIST)
Assistant Kiwamu Kudo(Toshiba) / Shuhei Yoshida(Kinki Univ.)

Paper Information
Registration To Technical Committee on Magnetic Recording / Technical Group on Multi-media Storage
Language JPN
Title (in Japanese) (See Japanese page)
Sub Title (in Japanese) (See Japanese page)
Title (in English) Sputter-deposition of inclined anisotropy film with Co/Pt atomic layer stacking
Sub Title (in English)
Keyword(1) Co/Pt layer stacking film
Keyword(2) Sputter-deposition with rotating substrate holder
Keyword(3) High Ar pressure deposition
Keyword(4) Stacking layer thickness dependence
Keyword(5) High magnetic anisotropy film
Keyword(6) Inclined anisotropy film
1st Author's Name Naoki Honda
1st Author's Affiliation Tohoku Institute of Technology(Tohoku Inst. Tech.)
2nd Author's Name Shintaro Hinata
2nd Author's Affiliation Tohoku University(Tohoku Univ.)
3rd Author's Name Shin Saito
3rd Author's Affiliation Tohoku University(Tohoku Univ.)
Date 2016-12-09
Paper # MR2016-38
Volume (vol) vol.116
Number (no) MR-348
Page pp.pp.51-56(MR),
#Pages 6
Date of Issue 2016-12-01 (MR)