Presentation | 2016-12-09 Sputter-deposition of inclined anisotropy film with Co/Pt atomic layer stacking Naoki Honda, Shintaro Hinata, Shin Saito, |
---|---|
PDF Download Page | PDF download Page Link |
Abstract(in Japanese) | (See Japanese page) |
Abstract(in English) | Deposition of weakly inclined anisotropy film for bit-patterned media was studied. First, deposition of Co/Pt layer stacking film with high perpendicular anisotropy and saturation magnetization was investigated by room temperature co-sputtering of Co and Pt with rotating substrate holder. A film with a high perpendicular anisotropy of 1×107 erg/cm3 and saturation magnetization of 600 emu/cm3 was obtained when a high deposition Ar pressure of 4.8 Pa and 3 mono-layer stacking of Co and 2 mono-layer stacking of Pt were adopted. The obtained Co/Pt film was applied to deposit inclined anisotropy film using tilted collimator sputtering. Inclination of anisotropy axis of around 8˚ with a high perpendicular coercivity of around 5 kOe was obtained. The result suggested possibility to make a bit-patterned media for high recording densities. |
Keyword(in Japanese) | (See Japanese page) |
Keyword(in English) | Co/Pt layer stacking film / Sputter-deposition with rotating substrate holder / High Ar pressure deposition / Stacking layer thickness dependence / High magnetic anisotropy film / Inclined anisotropy film |
Paper # | MR2016-38 |
Date of Issue | 2016-12-01 (MR) |
Conference Information | |
Committee | MR / ITE-MMS |
---|---|
Conference Date | 2016/12/8(2days) |
Place (in Japanese) | (See Japanese page) |
Place (in English) | Ehime Univ. |
Topics (in Japanese) | (See Japanese page) |
Topics (in English) | Signal Processing, etc. |
Chair | Yoshihiro Okamoto(Ehime Univ.) / Eiichi Miyashita(NHK) |
Vice Chair | |
Secretary | (Kogakuin Univ.) / (AIST) |
Assistant | Kiwamu Kudo(Toshiba) / Shuhei Yoshida(Kinki Univ.) |
Paper Information | |
Registration To | Technical Committee on Magnetic Recording / Technical Group on Multi-media Storage |
---|---|
Language | JPN |
Title (in Japanese) | (See Japanese page) |
Sub Title (in Japanese) | (See Japanese page) |
Title (in English) | Sputter-deposition of inclined anisotropy film with Co/Pt atomic layer stacking |
Sub Title (in English) | |
Keyword(1) | Co/Pt layer stacking film |
Keyword(2) | Sputter-deposition with rotating substrate holder |
Keyword(3) | High Ar pressure deposition |
Keyword(4) | Stacking layer thickness dependence |
Keyword(5) | High magnetic anisotropy film |
Keyword(6) | Inclined anisotropy film |
1st Author's Name | Naoki Honda |
1st Author's Affiliation | Tohoku Institute of Technology(Tohoku Inst. Tech.) |
2nd Author's Name | Shintaro Hinata |
2nd Author's Affiliation | Tohoku University(Tohoku Univ.) |
3rd Author's Name | Shin Saito |
3rd Author's Affiliation | Tohoku University(Tohoku Univ.) |
Date | 2016-12-09 |
Paper # | MR2016-38 |
Volume (vol) | vol.116 |
Number (no) | MR-348 |
Page | pp.pp.51-56(MR), |
#Pages | 6 |
Date of Issue | 2016-12-01 (MR) |