Presentation 2016-12-12
Characterization of GaxSn1-xO thin film by the mist CVD method
Hiroki Fukushima, Hiromasa Yuge, Mutsumi Kimura, Tokiyoshi Matsuda,
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Abstract(in Japanese) (See Japanese page)
Abstract(in English)
Keyword(in Japanese) (See Japanese page)
Keyword(in English)
Paper # EID2016-11,SDM2016-92
Date of Issue 2016-12-05 (EID, SDM)

Conference Information
Committee SDM / EID
Conference Date 2016/12/12(1days)
Place (in Japanese) (See Japanese page)
Place (in English) NAIST
Topics (in Japanese) (See Japanese page)
Topics (in English) Fabrication and Evaluation of Silicon Related Materials
Chair Tatsuya Kunikiyo(Renesas) / Tomokazu Shiga(Univ. of Electro-Comm.)
Vice Chair Takahiro Shinada(Tohoku Univ.) / Mutsumi Kimura(Ryukoku Univ.) / Yuko Kominami(Shizuoka Univ.)
Secretary Takahiro Shinada(Tohoku Univ.) / Mutsumi Kimura(Renesas) / Yuko Kominami(NTT)
Assistant Hiroya Ikeda(Shizuoka Univ.) / Rumiko Yamaguchi(Akita Univ.) / Hiroyuki Nitta(Japan Display) / Mitsuru Nakata(NHK) / Takashi Kojiri(ZEON) / Ryosuke Nonaka(Toshiba)

Paper Information
Registration To Technical Committee on Silicon Device and Materials / Technical Committee on Electronic Information Displays
Language JPN
Title (in Japanese) (See Japanese page)
Sub Title (in Japanese) (See Japanese page)
Title (in English) Characterization of GaxSn1-xO thin film by the mist CVD method
Sub Title (in English)
Keyword(1)
1st Author's Name Hiroki Fukushima
1st Author's Affiliation Ryukoku University(Ryukoku Univ.)
2nd Author's Name Hiromasa Yuge
2nd Author's Affiliation Ryukoku University(Ryukoku Univ.)
3rd Author's Name Mutsumi Kimura
3rd Author's Affiliation Ryukoku University(Ryukoku Univ.)
4th Author's Name Tokiyoshi Matsuda
4th Author's Affiliation Ryukoku University(Ryukoku Univ.)
Date 2016-12-12
Paper # EID2016-11,SDM2016-92
Volume (vol) vol.116
Number (no) EID-354,SDM-355
Page pp.pp.11-14(EID), pp.11-14(SDM),
#Pages 4
Date of Issue 2016-12-05 (EID, SDM)