Presentation 2016-11-28
Evaluation of Soft Error Rates of FlipFlops on FDSOI by Heavy Ions
Masashi Hifumi, Shigehiro Umehara, Haruki Maruoka, Jun Furuta, Kazutoshi Kobayashi,
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Abstract(in Japanese) (See Japanese page)
Abstract(in English) We evaluate tolerance for soft errors of FFs on a 28/65 nm FDSOI. We fabricated three different layouts of non-redundant FFs with same circuit area and, carried out heavy-ion measurement. Radiation hardbess isinfluenced by layout structures. Heavy ion irradiation reveals that the separated diffusion layout structure in 28 nm have 2x more cross section than shared diffusion one by the irradation of 40 MeV-cm2/mg ions. Flip-flops in 65 nm have almost equivalent cross sections at any energies. It is due to flucations of soft error tolerance caused by effects of layout structures of more scaled 28 nm node.
Keyword(in Japanese) (See Japanese page)
Keyword(in English) Soft Error / Heavy Ion / FDSOI / Flip Flop
Paper # VLD2016-51,DC2016-45
Date of Issue 2016-11-21 (VLD, DC)

Conference Information
Committee VLD / DC / CPSY / RECONF / CPM / ICD / IE
Conference Date 2016/11/28(3days)
Place (in Japanese) (See Japanese page)
Place (in English) Ritsumeikan University, Osaka Ibaraki Campus
Topics (in Japanese) (See Japanese page)
Topics (in English) Design Gaia 2016 -New Field of VLSI Design-
Chair Takashi Takenana(NEC) / Michiko Inoue(NAIST) / Yasuhiko Nakashima(NAIST) / Minoru Watanabe(Shizuoka Univ.) / Satoru Noge(Numazu National College of Tech.) / Minoru Fujishima(Hiroshima Univ.) / Seishi Takamura(NTT)
Vice Chair Hiroyuki Ochi(Ritsumeikan Univ.) / Satoshi Fukumoto(Tokyo Metropolitan Univ.) / Koji Nakano(Hiroshima Univ.) / Hidetsugu Irie(Univ. of Tokyo) / Masato Motomura(Hokkaido Univ.) / Yuichiro Shibata(Nagasaki Univ.) / Fumihiko Hirose(Yamagata Univ.) / Hideto Hidaka(Renesas) / Takayuki Hamamoto(Tokyo Univ. of Science) / Atsuro Ichigaya(NHK)
Secretary Hiroyuki Ochi(Fujitsu Labs.) / Satoshi Fukumoto(Hiroshima City Univ.) / Koji Nakano(Kyoto Sangyo Univ.) / Hidetsugu Irie(Tokyo Inst. of Tech.) / Masato Motomura(Fujitsu Labs.) / Yuichiro Shibata(NII) / Fumihiko Hirose(Univ. of Tsukuba) / Hideto Hidaka(Hiroshima City Univ.) / Takayuki Hamamoto(NTT) / Atsuro Ichigaya(Nihon Univ.)
Assistant Parizy Matthieu(Fujitsu Labs.) / / Takeshi Ohkawa(Utsunomiya Univ.) / Shinya Takameda(NAIST) / Takefumi Miyoshi(e-trees.Japan) / Yuuki Kobayashi(NEC) / Takashi Sakamoto(NTT) / Yuichi Nakamura(Toyohashi Univ. of Tech.) / Takashi Hashimoto(Panasonic) / Masanori Natsui(Tohoku Univ.) / Hiroyuki Ito(Tokyo Inst. of Tech.) / Pham Konkuha(Univ. of Electro-Comm.) / Kei Kawamura(KDDI R&D Labs.) / Keita Takahashi(Nagoya Univ.)

Paper Information
Registration To Technical Committee on VLSI Design Technologies / Technical Committee on Dependable Computing / Technical Committee on Computer Systems / Technical Committee on Reconfigurable Systems / Technical Committee on Component Parts and Materials / Technical Committee on Integrated Circuits and Devices / Technical Committee on Image Engineering
Language JPN
Title (in Japanese) (See Japanese page)
Sub Title (in Japanese) (See Japanese page)
Title (in English) Evaluation of Soft Error Rates of FlipFlops on FDSOI by Heavy Ions
Sub Title (in English)
Keyword(1) Soft Error
Keyword(2) Heavy Ion
Keyword(3) FDSOI
Keyword(4) Flip Flop
1st Author's Name Masashi Hifumi
1st Author's Affiliation Kyoto Institute of Technology(KIT)
2nd Author's Name Shigehiro Umehara
2nd Author's Affiliation Kyoto Institute of Technology(KIT)
3rd Author's Name Haruki Maruoka
3rd Author's Affiliation Kyoto Institute of Technology(KIT)
4th Author's Name Jun Furuta
4th Author's Affiliation Kyoto Institute of Technology(KIT)
5th Author's Name Kazutoshi Kobayashi
5th Author's Affiliation Kyoto Institute of Technology(KIT)
Date 2016-11-28
Paper # VLD2016-51,DC2016-45
Volume (vol) vol.116
Number (no) VLD-330,DC-331
Page pp.pp.43-48(VLD), pp.43-48(DC),
#Pages 6
Date of Issue 2016-11-21 (VLD, DC)