Presentation 2016-11-19
Microwave activated chemical bath deposition of ZnO thin films
Hiroaki Yoshiyachi, Yasushi Takano,
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Abstract(in Japanese) (See Japanese page)
Abstract(in English) Zinc oxide (ZnO) film has been deposited using chemical bath deposition (CBD).We compared ZnO fims deposited by microwave heating of the substrate and reaction mixture with ZnO films deposited using oil bath srirrer. The thin films were investigated by secondary electoron microscopy, SEM and x-ray diffraction, XRD measurement. We obtained ZnO thin films which have various morphology by using microwave.
Keyword(in Japanese) (See Japanese page)
Keyword(in English) zinc oxide / chemical bath deposition / II-VI compound semiconductor / Microwave
Paper # CPM2016-72
Date of Issue 2016-11-11 (CPM)

Conference Information
Committee CPM
Conference Date 2016/11/18(2days)
Place (in Japanese) (See Japanese page)
Place (in English)
Topics (in Japanese) (See Japanese page)
Topics (in English)
Chair Satoru Noge(Numazu National College of Tech.)
Vice Chair Fumihiko Hirose(Yamagata Univ.)
Secretary Fumihiko Hirose(NTT)
Assistant Takashi Sakamoto(NTT) / Yuichi Nakamura(Toyohashi Univ. of Tech.)

Paper Information
Registration To Technical Committee on Component Parts and Materials
Language JPN
Title (in Japanese) (See Japanese page)
Sub Title (in Japanese) (See Japanese page)
Title (in English) Microwave activated chemical bath deposition of ZnO thin films
Sub Title (in English)
Keyword(1) zinc oxide
Keyword(2) chemical bath deposition
Keyword(3) II-VI compound semiconductor
Keyword(4) Microwave
1st Author's Name Hiroaki Yoshiyachi
1st Author's Affiliation Shizuoka University(Shizuoka Univ.)
2nd Author's Name Yasushi Takano
2nd Author's Affiliation Shizuoka University(Shizuoka Univ.)
Date 2016-11-19
Paper # CPM2016-72
Volume (vol) vol.116
Number (no) CPM-311
Page pp.pp.55-58(CPM),
#Pages 4
Date of Issue 2016-11-11 (CPM)