Presentation 2016-01-20
[Invited Lecture] Improvement in fmax of InP-based HEMTs for THz ICs
Tsuyoshi Takahashi, Yoichi Kawano, Kozo Makiyama, Shoichi Shiba, Yasuhiro Nakasha, Naoki Hara,
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Abstract(in Japanese) (See Japanese page)
Abstract(in English) High performance THz receivers should be required to realize high-speed wireless radio communications systems for increased data transmission. We developed THz ICs that have a power gain of 23 dB at 300 GHz band by utilizing high-speed InP-based HEMTs. The HEMT improved both cutoff frequency (fT) and maximum frequency of oscillation (fmax) by adopting a cavity structure around the gate region to decrease parasitic capacitances even though they are fully passivated with dielectric films after multilayer interconnections. Mostly, the fmax, i.e. power gain, is important for operating multi-stage amplifiers. We achieved an fmax of 660 GHz after modifying epitaxial layer and device structures. Further improvement in fmax was expected by employing modified device structure.
Keyword(in Japanese) (See Japanese page)
Keyword(in English) InP HEMT / THz / parasitic capacitance / cavity / cutoff frequency / fmax / gain / drain conductance
Paper # ED2015-118
Date of Issue 2016-01-13 (ED)

Conference Information
Committee ED
Conference Date 2016/1/20(1days)
Place (in Japanese) (See Japanese page)
Place (in English) Kikai-Shinko-Kaikan Bldg.
Topics (in Japanese) (See Japanese page)
Topics (in English) Power Devices and High-frequency Devices, Microwave, etc.
Chair Koichi Maezawa(Univ. of Toyama)
Vice Chair Kunio Tsuda(Toshiba)
Secretary Kunio Tsuda(NEC)
Assistant Manabu Arai(New JRC) / Masataka Higashiwaki(NICT)

Paper Information
Registration To Technical Committee on Electron Device
Language JPN
Title (in Japanese) (See Japanese page)
Sub Title (in Japanese) (See Japanese page)
Title (in English) [Invited Lecture] Improvement in fmax of InP-based HEMTs for THz ICs
Sub Title (in English)
Keyword(1) InP HEMT
Keyword(2) THz
Keyword(3) parasitic capacitance
Keyword(4) cavity
Keyword(5) cutoff frequency
Keyword(6) fmax
Keyword(7) gain
Keyword(8) drain conductance
1st Author's Name Tsuyoshi Takahashi
1st Author's Affiliation Fujitsu Laboratories Ltd.(Fujitsu Labs.)
2nd Author's Name Yoichi Kawano
2nd Author's Affiliation Fujitsu Laboratories Ltd.(Fujitsu Labs.)
3rd Author's Name Kozo Makiyama
3rd Author's Affiliation Fujitsu Laboratories Ltd.(Fujitsu Labs.)
4th Author's Name Shoichi Shiba
4th Author's Affiliation Fujitsu Laboratories Ltd.(Fujitsu Labs.)
5th Author's Name Yasuhiro Nakasha
5th Author's Affiliation Fujitsu Laboratories Ltd.(Fujitsu Labs.)
6th Author's Name Naoki Hara
6th Author's Affiliation Fujitsu Laboratories Ltd.(Fujitsu Labs.)
Date 2016-01-20
Paper # ED2015-118
Volume (vol) vol.115
Number (no) ED-402
Page pp.pp.37-41(ED),
#Pages 5
Date of Issue 2016-01-13 (ED)