Presentation	2015-12-14 Distribution of Forming Characteristics in NiO-based ReRAM Yusuke Nishi, Tsunenobu Kimoto,
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Abstract(in Japanese)	(See Japanese page)
Abstract(in English)
Keyword(in Japanese)	(See Japanese page)
Keyword(in English)
Paper #	EID2015-12,SDM2015-95
Date of Issue	2015-12-07 (EID, SDM)

Conference Information
Committee	EID / SDM
Conference Date	2015/12/14(1days)
Place (in Japanese)	(See Japanese page)
Place (in English)	Ryukoku University, Avanti Kyoto Hall
Topics (in Japanese)	(See Japanese page)
Topics (in English)	Si and Si-related Materials and Devices, and Display Technology
Chair	Tomokazu Shiga(Univ. of Electro-Comm.) / Yuzou Oono(Univ. of Tsukuba)
Vice Chair	Mutsumi Kimura(Ryukoku Univ.) / Yuko Kominami(Shizuoka Univ.) / Tatsuya Kunikiyo(Renesas)
Secretary	Mutsumi Kimura(NTT) / Yuko Kominami(Tokyo Inst. of Tech.) / Tatsuya Kunikiyo(Tohoku Univ.)
Assistant	Rumiko Yamaguchi(Akita Univ.) / Hiroyuki Nitta(Japan Display) / Mitsuru Nakata(NHK) / Takashi Kojiri(ZEON) / Ryosuke Nonaka(Toshiba) / Takeshi Okuno(Samsung) / Tadashi Yamaguchi(Renesas)

Paper Information
Registration To	Technical Committee on Electronic Information Displays / Technical Committee on Silicon Device and Materials
Language	JPN
Title (in Japanese)	(See Japanese page)
Sub Title (in Japanese)	(See Japanese page)
Title (in English)	Distribution of Forming Characteristics in NiO-based ReRAM
Sub Title (in English)
Keyword(1)
1st Author's Name	Yusuke Nishi
1st Author's Affiliation	Kyoto University(Kyoto Univ.)
2nd Author's Name	Tsunenobu Kimoto
2nd Author's Affiliation	Kyoto University(Kyoto Univ.)
Date	2015-12-14
Paper #	EID2015-12,SDM2015-95
Volume (vol)	vol.115
Number (no)	EID-362,SDM-363
Page	pp.pp.13-17(EID), pp.13-17(SDM),
#Pages	5
Date of Issue	2015-12-07 (EID, SDM)