Presentation 2015-10-29
[Invited Talk] Current situation and challenging for ion implantation technology
Yoshiki Nakashima, Nariaki Hamamoto, Shigeki Sakai, Hiroshi Onoda,
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Abstract(in Japanese) (See Japanese page)
Abstract(in English)
Keyword(in Japanese) (See Japanese page)
Keyword(in English)
Paper # SDM2015-71
Date of Issue 2015-10-22 (SDM)

Conference Information
Committee SDM
Conference Date 2015/10/29(2days)
Place (in Japanese) (See Japanese page)
Place (in English) Niche, Tohoku Univ.
Topics (in Japanese) (See Japanese page)
Topics (in English) Process Science and New Process Technology
Chair Yuzou Oono(Univ. of Tsukuba)
Vice Chair Tatsuya Kunikiyo(Renesas)
Secretary Tatsuya Kunikiyo(Tohoku Univ.)
Assistant Tadashi Yamaguchi(Renesas)

Paper Information
Registration To Technical Committee on Silicon Device and Materials
Language JPN
Title (in Japanese) (See Japanese page)
Sub Title (in Japanese) (See Japanese page)
Title (in English) [Invited Talk] Current situation and challenging for ion implantation technology
Sub Title (in English)
Keyword(1)
1st Author's Name Yoshiki Nakashima
1st Author's Affiliation Nissin Ion Equipment Co. LTD.(NIC)
2nd Author's Name Nariaki Hamamoto
2nd Author's Affiliation Nissin Ion Equipment Co. LTD.(NIC)
3rd Author's Name Shigeki Sakai
3rd Author's Affiliation Nissin Ion Equipment Co. LTD.(NIC)
4th Author's Name Hiroshi Onoda
4th Author's Affiliation Nissin Ion Equipment Co. LTD.(NIC)
Date 2015-10-29
Paper # SDM2015-71
Volume (vol) vol.115
Number (no) SDM-280
Page pp.pp.1-6(SDM),
#Pages 6
Date of Issue 2015-10-22 (SDM)