Presentation | 2015-08-27 Highly reliable a-InGaZnO thin-film transistors with fluorine in a gate insulator Haruka Yamazaki, Yasuaki Ishikawa, Mami Fujii, Juan Paolo Bermundo, Eiji Takahashi, Yasunori Andoh, Yukiharu Uraoka, |
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PDF Download Page | PDF download Page Link |
Abstract(in Japanese) | (See Japanese page) |
Abstract(in English) | Considerable attention has been paid to amorphous indium-gallium-zinc oxide (a-IGZO) thin-film transistors (TFTs) as peripheral circuits for displays. However, achieving highly reliable a-IGZO TFTs continues to be a serious challenge. We propose a-IGZO TFTs with a fluorinated silicon nitride (SiNx:F) gate insulator (GI) which showed good reliability against positive bias temperature stress (PBTS) compared with those with thermally oxidized SiO2 GIs. From the result of X-ray photoelectron spectroscopy analysis, the fluorine in SiNx:F formed a bonding state with indium at the interface between SiNx:F and a-IGZO. Here we report a reliability-improvement mechanism using SiNx:F GIs. |
Keyword(in Japanese) | (See Japanese page) |
Keyword(in English) | thin-film transistor / a-IGZO / gate insulator / reliability / fluorine |
Paper # | R2015-24,EMD2015-32,CPM2015-48,OPE2015-63,LQE2015-32 |
Date of Issue | 2015-08-20 (R, EMD, CPM, OPE, LQE) |
Conference Information | |
Committee | CPM / OPE / LQE / R / EMD |
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Conference Date | 2015/8/27(2days) |
Place (in Japanese) | (See Japanese page) |
Place (in English) | Aomori-Bussankan-Asupamu |
Topics (in Japanese) | (See Japanese page) |
Topics (in English) | |
Chair | Satoru Noge(Numazu National College of Tech.) / Hiroyuki Uenohara(Tokyo Inst. of Tech.) / Hajime Shoji(Sumitomo Electric Industries) / Hiroyasu Mawatari(NTT) / Junya Sekikawa(Shizuoka Univ.) |
Vice Chair | Fumihiko Hirose(Yamagata Univ.) / Kensuke Ogawa(Fujikura) / Susumu Noda(Kyoto Univ.) / Tetsushi Yuge(National Defense Academy) / Yoshiteru Abe(NTT) |
Secretary | Fumihiko Hirose(NTT) / Kensuke Ogawa(Nihon Univ.) / Susumu Noda(Fujitsu Labs.) / Tetsushi Yuge(NTT) / Yoshiteru Abe(NICT) |
Assistant | Takashi Sakamoto(NTT) / Yuichi Nakamura(Toyohashi Univ. of Tech.) / Takaaki Ishigure(Keio Univ.) / Eiji Yagyu(Mitsubishi Electric) / / Maratt Zanikef(Kyushu Inst. of Tech.) / Nobuyuki Tamura(Hosei Univ.) / Shinichi Wada(TMC system) |
Paper Information | |
Registration To | Technical Committee on Component Parts and Materials / Technical Committee on Optoelectronics / Technical Committee on Lasers and Quantum Electronics / Technical Committee on Reliability / Technical Committee on Electromechanical Devices |
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Language | JPN |
Title (in Japanese) | (See Japanese page) |
Sub Title (in Japanese) | (See Japanese page) |
Title (in English) | Highly reliable a-InGaZnO thin-film transistors with fluorine in a gate insulator |
Sub Title (in English) | |
Keyword(1) | thin-film transistor |
Keyword(2) | a-IGZO |
Keyword(3) | gate insulator |
Keyword(4) | reliability |
Keyword(5) | fluorine |
1st Author's Name | Haruka Yamazaki |
1st Author's Affiliation | Nara institute of science and technology(NAIST) |
2nd Author's Name | Yasuaki Ishikawa |
2nd Author's Affiliation | Nara institute of science and technology(NAIST) |
3rd Author's Name | Mami Fujii |
3rd Author's Affiliation | Nara institute of science and technology(NAIST) |
4th Author's Name | Juan Paolo Bermundo |
4th Author's Affiliation | Nara institute of science and technology(NAIST) |
5th Author's Name | Eiji Takahashi |
5th Author's Affiliation | Nissin Electric Co.,Ltd(Nissin Electric) |
6th Author's Name | Yasunori Andoh |
6th Author's Affiliation | Nissin Electric Co.,Ltd(Nissin Electric) |
7th Author's Name | Yukiharu Uraoka |
7th Author's Affiliation | Nara institute of science and technology(NAIST) |
Date | 2015-08-27 |
Paper # | R2015-24,EMD2015-32,CPM2015-48,OPE2015-63,LQE2015-32 |
Volume (vol) | vol.115 |
Number (no) | R-194,EMD-195,CPM-196,OPE-197,LQE-198 |
Page | pp.pp.9-11(R), pp.9-11(EMD), pp.9-11(CPM), pp.9-11(OPE), pp.9-11(LQE), |
#Pages | 3 |
Date of Issue | 2015-08-20 (R, EMD, CPM, OPE, LQE) |