Presentation 2015-08-27
Highly reliable a-InGaZnO thin-film transistors with fluorine in a gate insulator
Haruka Yamazaki, Yasuaki Ishikawa, Mami Fujii, Juan Paolo Bermundo, Eiji Takahashi, Yasunori Andoh, Yukiharu Uraoka,
PDF Download Page PDF download Page Link
Abstract(in Japanese) (See Japanese page)
Abstract(in English) Considerable attention has been paid to amorphous indium-gallium-zinc oxide (a-IGZO) thin-film transistors (TFTs) as peripheral circuits for displays. However, achieving highly reliable a-IGZO TFTs continues to be a serious challenge. We propose a-IGZO TFTs with a fluorinated silicon nitride (SiNx:F) gate insulator (GI) which showed good reliability against positive bias temperature stress (PBTS) compared with those with thermally oxidized SiO2 GIs. From the result of X-ray photoelectron spectroscopy analysis, the fluorine in SiNx:F formed a bonding state with indium at the interface between SiNx:F and a-IGZO. Here we report a reliability-improvement mechanism using SiNx:F GIs.
Keyword(in Japanese) (See Japanese page)
Keyword(in English) thin-film transistor / a-IGZO / gate insulator / reliability / fluorine
Paper # R2015-24,EMD2015-32,CPM2015-48,OPE2015-63,LQE2015-32
Date of Issue 2015-08-20 (R, EMD, CPM, OPE, LQE)

Conference Information
Committee CPM / OPE / LQE / R / EMD
Conference Date 2015/8/27(2days)
Place (in Japanese) (See Japanese page)
Place (in English) Aomori-Bussankan-Asupamu
Topics (in Japanese) (See Japanese page)
Topics (in English)
Chair Satoru Noge(Numazu National College of Tech.) / Hiroyuki Uenohara(Tokyo Inst. of Tech.) / Hajime Shoji(Sumitomo Electric Industries) / Hiroyasu Mawatari(NTT) / Junya Sekikawa(Shizuoka Univ.)
Vice Chair Fumihiko Hirose(Yamagata Univ.) / Kensuke Ogawa(Fujikura) / Susumu Noda(Kyoto Univ.) / Tetsushi Yuge(National Defense Academy) / Yoshiteru Abe(NTT)
Secretary Fumihiko Hirose(NTT) / Kensuke Ogawa(Nihon Univ.) / Susumu Noda(Fujitsu Labs.) / Tetsushi Yuge(NTT) / Yoshiteru Abe(NICT)
Assistant Takashi Sakamoto(NTT) / Yuichi Nakamura(Toyohashi Univ. of Tech.) / Takaaki Ishigure(Keio Univ.) / Eiji Yagyu(Mitsubishi Electric) / / Maratt Zanikef(Kyushu Inst. of Tech.) / Nobuyuki Tamura(Hosei Univ.) / Shinichi Wada(TMC system)

Paper Information
Registration To Technical Committee on Component Parts and Materials / Technical Committee on Optoelectronics / Technical Committee on Lasers and Quantum Electronics / Technical Committee on Reliability / Technical Committee on Electromechanical Devices
Language JPN
Title (in Japanese) (See Japanese page)
Sub Title (in Japanese) (See Japanese page)
Title (in English) Highly reliable a-InGaZnO thin-film transistors with fluorine in a gate insulator
Sub Title (in English)
Keyword(1) thin-film transistor
Keyword(2) a-IGZO
Keyword(3) gate insulator
Keyword(4) reliability
Keyword(5) fluorine
1st Author's Name Haruka Yamazaki
1st Author's Affiliation Nara institute of science and technology(NAIST)
2nd Author's Name Yasuaki Ishikawa
2nd Author's Affiliation Nara institute of science and technology(NAIST)
3rd Author's Name Mami Fujii
3rd Author's Affiliation Nara institute of science and technology(NAIST)
4th Author's Name Juan Paolo Bermundo
4th Author's Affiliation Nara institute of science and technology(NAIST)
5th Author's Name Eiji Takahashi
5th Author's Affiliation Nissin Electric Co.,Ltd(Nissin Electric)
6th Author's Name Yasunori Andoh
6th Author's Affiliation Nissin Electric Co.,Ltd(Nissin Electric)
7th Author's Name Yukiharu Uraoka
7th Author's Affiliation Nara institute of science and technology(NAIST)
Date 2015-08-27
Paper # R2015-24,EMD2015-32,CPM2015-48,OPE2015-63,LQE2015-32
Volume (vol) vol.115
Number (no) R-194,EMD-195,CPM-196,OPE-197,LQE-198
Page pp.pp.9-11(R), pp.9-11(EMD), pp.9-11(CPM), pp.9-11(OPE), pp.9-11(LQE),
#Pages 3
Date of Issue 2015-08-20 (R, EMD, CPM, OPE, LQE)