Presentation 2015-05-29
Sulfur annealing of electrochemically deposited iron sulfide thin films and application to heterojunction cells with ZnO
Takahiro Kajima, Shoichi Kawai, Masaya Ichimura,
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Abstract(in Japanese) (See Japanese page)
Abstract(in English) The electrochemical deposition (ECD) is a method to deposit thin films by reducing ions in an aqueous solution. FeS2 (pyrite) is a semiconductor which consist of abundant and nontoxic elements and has high optical absorption coefficient. In this research, iron sulfide thin films were deposited by ECD and annealed with sulfur powder. By annealing at 400℃, we confirmed decrease of oxygen ratio and crystallization of iron pyrite. Then, we fabricated heterojunction cells using iron sulfide and ZnO thin films and confirmed rectification, but the leakage current was increased and the forward current was decreased by the annealing.
Keyword(in Japanese) (See Japanese page)
Keyword(in English) Electrochemical deposition / FeS2 / pyrite / Solar cell
Paper # ED2015-34,CPM2015-19,SDM2015-36
Date of Issue 2015-05-21 (ED, CPM, SDM)

Conference Information
Committee ED / CPM / SDM
Conference Date 2015/5/28(2days)
Place (in Japanese) (See Japanese page)
Place (in English) Venture Business Laboratory, Toyohashi University of Technology
Topics (in Japanese) (See Japanese page)
Topics (in English) crystal growth、devices characterization , etc.
Chair Naoki Hara(Fujitsu Labs.) / Yasushi Takano(Shizuoka Univ.) / Yuzou Oono(Univ. of Tsukuba)
Vice Chair Koichi Maezawa(Univ. of Toyama) / Satoru Noge(Numazu National College of Tech.) / Tatsuya Kunikiyo(Renesas)
Secretary Koichi Maezawa(Hokkaido Univ.) / Satoru Noge(NEC) / Tatsuya Kunikiyo(Kanagawa Univ.)
Assistant Toshikazu Suzuki(JAIST) / Manabu Arai(New JRC) / Nobuyuki Iwata(Nihon Univ.) / Takashi Sakamoto(NTT) / Tadashi Yamaguchi(Renesas)

Paper Information
Registration To Technical Committee on Electron Device / Technical Committee on Component Parts and Materials / Technical Committee on Silicon Device and Materials
Language JPN
Title (in Japanese) (See Japanese page)
Sub Title (in Japanese) (See Japanese page)
Title (in English) Sulfur annealing of electrochemically deposited iron sulfide thin films and application to heterojunction cells with ZnO
Sub Title (in English)
Keyword(1) Electrochemical deposition
Keyword(2) FeS2
Keyword(3) pyrite
Keyword(4) Solar cell
1st Author's Name Takahiro Kajima
1st Author's Affiliation Nagoya Institute of Technology(Nagoya Inst. of Tech.)
2nd Author's Name Shoichi Kawai
2nd Author's Affiliation DENSO Corporation(DENSO CORP.)
3rd Author's Name Masaya Ichimura
3rd Author's Affiliation Nagoya Institute of Technology(Nagoya Inst. of Tech.)
Date 2015-05-29
Paper # ED2015-34,CPM2015-19,SDM2015-36
Volume (vol) vol.115
Number (no) ED-63,CPM-64,SDM-65
Page pp.pp.91-95(ED), pp.91-95(CPM), pp.91-95(SDM),
#Pages 5
Date of Issue 2015-05-21 (ED, CPM, SDM)