Presentation | 2015-05-29 Sulfur annealing of electrochemically deposited iron sulfide thin films and application to heterojunction cells with ZnO Takahiro Kajima, Shoichi Kawai, Masaya Ichimura, |
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PDF Download Page | PDF download Page Link |
Abstract(in Japanese) | (See Japanese page) |
Abstract(in English) | The electrochemical deposition (ECD) is a method to deposit thin films by reducing ions in an aqueous solution. FeS2 (pyrite) is a semiconductor which consist of abundant and nontoxic elements and has high optical absorption coefficient. In this research, iron sulfide thin films were deposited by ECD and annealed with sulfur powder. By annealing at 400℃, we confirmed decrease of oxygen ratio and crystallization of iron pyrite. Then, we fabricated heterojunction cells using iron sulfide and ZnO thin films and confirmed rectification, but the leakage current was increased and the forward current was decreased by the annealing. |
Keyword(in Japanese) | (See Japanese page) |
Keyword(in English) | Electrochemical deposition / FeS2 / pyrite / Solar cell |
Paper # | ED2015-34,CPM2015-19,SDM2015-36 |
Date of Issue | 2015-05-21 (ED, CPM, SDM) |
Conference Information | |
Committee | ED / CPM / SDM |
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Conference Date | 2015/5/28(2days) |
Place (in Japanese) | (See Japanese page) |
Place (in English) | Venture Business Laboratory, Toyohashi University of Technology |
Topics (in Japanese) | (See Japanese page) |
Topics (in English) | crystal growth、devices characterization , etc. |
Chair | Naoki Hara(Fujitsu Labs.) / Yasushi Takano(Shizuoka Univ.) / Yuzou Oono(Univ. of Tsukuba) |
Vice Chair | Koichi Maezawa(Univ. of Toyama) / Satoru Noge(Numazu National College of Tech.) / Tatsuya Kunikiyo(Renesas) |
Secretary | Koichi Maezawa(Hokkaido Univ.) / Satoru Noge(NEC) / Tatsuya Kunikiyo(Kanagawa Univ.) |
Assistant | Toshikazu Suzuki(JAIST) / Manabu Arai(New JRC) / Nobuyuki Iwata(Nihon Univ.) / Takashi Sakamoto(NTT) / Tadashi Yamaguchi(Renesas) |
Paper Information | |
Registration To | Technical Committee on Electron Device / Technical Committee on Component Parts and Materials / Technical Committee on Silicon Device and Materials |
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Language | JPN |
Title (in Japanese) | (See Japanese page) |
Sub Title (in Japanese) | (See Japanese page) |
Title (in English) | Sulfur annealing of electrochemically deposited iron sulfide thin films and application to heterojunction cells with ZnO |
Sub Title (in English) | |
Keyword(1) | Electrochemical deposition |
Keyword(2) | FeS2 |
Keyword(3) | pyrite |
Keyword(4) | Solar cell |
1st Author's Name | Takahiro Kajima |
1st Author's Affiliation | Nagoya Institute of Technology(Nagoya Inst. of Tech.) |
2nd Author's Name | Shoichi Kawai |
2nd Author's Affiliation | DENSO Corporation(DENSO CORP.) |
3rd Author's Name | Masaya Ichimura |
3rd Author's Affiliation | Nagoya Institute of Technology(Nagoya Inst. of Tech.) |
Date | 2015-05-29 |
Paper # | ED2015-34,CPM2015-19,SDM2015-36 |
Volume (vol) | vol.115 |
Number (no) | ED-63,CPM-64,SDM-65 |
Page | pp.pp.91-95(ED), pp.91-95(CPM), pp.91-95(SDM), |
#Pages | 5 |
Date of Issue | 2015-05-21 (ED, CPM, SDM) |