Presentation 2015-04-30
Low Resistivity of poly-Si films by LA Laser Annealing
Takashi Noguchi, Tatsuya Okada,
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Abstract(in Japanese) (See Japanese page)
Abstract(in English)
Keyword(in Japanese) (See Japanese page)
Keyword(in English)
Paper # SDM2015-15,OME2015-15
Date of Issue 2015-04-22 (SDM, OME)

Conference Information
Committee OME / SDM
Conference Date 2015/4/29(2days)
Place (in Japanese) (See Japanese page)
Place (in English) Oh-hama Nobumoto Memorial Hall
Topics (in Japanese) (See Japanese page)
Topics (in English) Thin FIlms, Functional Electronics Devices, New Functional Materials and Evaluation, BIomtechnology
Chair Keizo Kato(Niigata Univ.) / Yuzou Oono(Univ. of Tsukuba)
Vice Chair Naoki Matsuda(AIST) / Tatsuya Kunikiyo(Renesas)
Secretary Naoki Matsuda(Canon Electronics) / Tatsuya Kunikiyo(Aichi Inst. of Tech.)
Assistant Akihiro Kohno(NTT) / Shinichiro Inoue(NICT) / Tadashi Yamaguchi(Renesas)

Paper Information
Registration To Technical Committee on Organic Molecular Electronics / Technical Committee on Silicon Device and Materials
Language JPN
Title (in Japanese) (See Japanese page)
Sub Title (in Japanese) (See Japanese page)
Title (in English) Low Resistivity of poly-Si films by LA Laser Annealing
Sub Title (in English)
Keyword(1)
1st Author's Name Takashi Noguchi
1st Author's Affiliation Univeristy of the Ryukyus(Univ. Ryukyus)
2nd Author's Name Tatsuya Okada
2nd Author's Affiliation Univeristy of the Ryukyus(Univ. Ryukyus)
Date 2015-04-30
Paper # SDM2015-15,OME2015-15
Volume (vol) vol.115
Number (no) SDM-18,OME-19
Page pp.pp.57-61(SDM), pp.57-61(OME),
#Pages 5
Date of Issue 2015-04-22 (SDM, OME)