Presentation 2015-04-16
Effect of ALD Deposited HfO2 Coating on TiO2 Photo Electrodes in Dye Sensitized Solar Cells
Takahiro Imai, Yuki Kato, Bashir Ahmmad Arima, Shigeru Kubota, Fumihiko Hirose,
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Abstract(in Japanese) (See Japanese page)
Abstract(in English)
Keyword(in Japanese) (See Japanese page)
Keyword(in English) Atomic layer deposition / Metal oxide / Dye sensitized solar cell
Paper # ED2015-4
Date of Issue 2015-04-09 (ED)

Conference Information
Committee ED
Conference Date 2015/4/16(2days)
Place (in Japanese) (See Japanese page)
Place (in English) Laboratory for Nanoelectronics and Spintronics
Topics (in Japanese) (See Japanese page)
Topics (in English)
Chair Naoki Hara(Fujitsu Labs.)
Vice Chair Koichi Maezawa(Univ. of Toyama)
Secretary Koichi Maezawa(Hokkaido Univ.)
Assistant Toshikazu Suzuki(JAIST) / Manabu Arai(New JRC)

Paper Information
Registration To Technical Committee on Electron Device
Language JPN
Title (in Japanese) (See Japanese page)
Sub Title (in Japanese) (See Japanese page)
Title (in English) Effect of ALD Deposited HfO2 Coating on TiO2 Photo Electrodes in Dye Sensitized Solar Cells
Sub Title (in English)
Keyword(1) Atomic layer deposition
Keyword(2) Metal oxide
Keyword(3) Dye sensitized solar cell
1st Author's Name Takahiro Imai
1st Author's Affiliation Yamagata University(Yamagata Univ.)
2nd Author's Name Yuki Kato
2nd Author's Affiliation Yamagata University(Yamagata Univ.)
3rd Author's Name Bashir Ahmmad Arima
3rd Author's Affiliation Yamagata University(Yamagata Univ.)
4th Author's Name Shigeru Kubota
4th Author's Affiliation Yamagata University(Yamagata Univ.)
5th Author's Name Fumihiko Hirose
5th Author's Affiliation Yamagata University(Yamagata Univ.)
Date 2015-04-16
Paper # ED2015-4
Volume (vol) vol.115
Number (no) ED-5
Page pp.pp.15-18(ED),
#Pages 4
Date of Issue 2015-04-09 (ED)