Presentation 2024-02-28
Research on Routing Method for Spacer-Is-Metal Type Self-Aligned Double Patterning
Koki Tanaka, Takuto Amari, Kunihiro Fujiyoshi,
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Abstract(in Japanese) (See Japanese page)
Abstract(in English) SIM type Self-Aligned Double Patterning is one of the process technologies wiring with a pitch half of the exposure-possible pitch. Since wiring patterns obtained by this technology are only cut off circular areas, wiring design is difficult. To work on this problem, Akatsuka et al. clarified some sufficient conditions where given terminals can be wired and showed a wiring method in the case. However, the positional relationships of terminals he named ``Cross Crossing” and ``Triple Overlap” were excluded because of the difficulty of wiring. In this paper, only in some cases including either ``Cross Crossing” or ``Triple Overlap”, we clarify some sufficient conditions where given terminals can be wired and show a wiring method in the case.
Keyword(in Japanese) (See Japanese page)
Keyword(in English) Spacer-Is-Metal type Self-Aligned Double Patterning / SIM type SADP / Routing design / LSI
Paper # VLD2023-105,HWS2023-65,ICD2023-94
Date of Issue 2024-02-21 (VLD, HWS, ICD)

Conference Information
Committee VLD / HWS / ICD
Conference Date 2024/2/28(4days)
Place (in Japanese) (See Japanese page)
Place (in English)
Topics (in Japanese) (See Japanese page)
Topics (in English)
Chair Shigetoshi Nakatake(Univ. of Kitakyushu) / Daisuke Suzuki(Mitsubishi Electric) / Makoto Ikeda(Univ. of Tokyo)
Vice Chair Yuichi Sakurai(Hitachi) / Yuichi Hayashi(NAIST) / Toru Akishita(Sony Semiconductor Solutions) / Hayato Wakabayashi(Sony Semiconductor Solutions)
Secretary Yuichi Sakurai(Socionext) / Yuichi Hayashi(Hirosaki Univ.) / Toru Akishita(Sony Semiconductor Solutions) / Hayato Wakabayashi(AIST)
Assistant Takuma Nishimoto(Hitachi) / / Ryo Shirai(Kyoto Univ.) / Jun Shiomi(Osaka Univ.) / Takeshi Kuboki(Sony Semiconductor Solutions)

Paper Information
Registration To Technical Committee on VLSI Design Technologies / Technical Committee on Hardware Security / Technical Committee on Integrated Circuits and Devices
Language JPN
Title (in Japanese) (See Japanese page)
Sub Title (in Japanese) (See Japanese page)
Title (in English) Research on Routing Method for Spacer-Is-Metal Type Self-Aligned Double Patterning
Sub Title (in English)
Keyword(1) Spacer-Is-Metal type Self-Aligned Double Patterning
Keyword(2) SIM type SADP
Keyword(3) Routing design
Keyword(4) LSI
1st Author's Name Koki Tanaka
1st Author's Affiliation Tokyo University of Agriculture and Technology(TUAT)
2nd Author's Name Takuto Amari
2nd Author's Affiliation Tokyo University of Agriculture and Technology(TUAT)
3rd Author's Name Kunihiro Fujiyoshi
3rd Author's Affiliation Tokyo University of Agriculture and Technology(TUAT)
Date 2024-02-28
Paper # VLD2023-105,HWS2023-65,ICD2023-94
Volume (vol) vol.123
Number (no) VLD-390,HWS-391,ICD-392
Page pp.pp.36-41(VLD), pp.36-41(HWS), pp.36-41(ICD),
#Pages 6
Date of Issue 2024-02-21 (VLD, HWS, ICD)