| Presentation | 2024-01-31 [Invited Talk] Endurance Improvement of HfO-FeFET by Controlled Charge Trapping Kunifumi Suzuki, |
|---|---|
| PDF Download Page |  PDF download Page Link |
| Abstract(in Japanese) | (See Japanese page) |
| Abstract(in English) | |
| Keyword(in Japanese) | (See Japanese page) |
| Keyword(in English) | |
| Paper # | SDM2023-78 |
| Date of Issue | 2024-01-24 (SDM) |
| Conference Information | |
| Committee | SDM |
|---|---|
| Conference Date | 2024/1/31(1days) |
| Place (in Japanese) | (See Japanese page) |
| Place (in English) | KIT Toranomon Graduate School |
| Topics (in Japanese) | (See Japanese page) |
| Topics (in English) | Advanced semiconductor devices and processes (Special feature on IEDM) |
| Chair | Shunichiro Ohmi(Tokyo Inst. of Tech.) |
| Vice Chair | Tatsuya Usami(Rapidus) |
| Secretary | Tatsuya Usami(Tohoku Univ.) |
| Assistant | Takuji Hosoi(Kwansei Gakuin Univ.) / Takuya Futase(Western Digital) |
| Paper Information | |
| Registration To | Technical Committee on Silicon Device and Materials |
|---|---|
| Language | JPN |
| Title (in Japanese) | (See Japanese page) |
| Sub Title (in Japanese) | (See Japanese page) |
| Title (in English) | [Invited Talk] Endurance Improvement of HfO-FeFET by Controlled Charge Trapping |
| Sub Title (in English) | |
| Keyword(1) | |
| 1st Author's Name | Kunifumi Suzuki |
| 1st Author's Affiliation | KIOXIA CORPORATION(KIOXIA) |
| Date | 2024-01-31 |
| Paper # | SDM2023-78 |
| Volume (vol) | vol.123 |
| Number (no) | SDM-375 |
| Page | pp.pp.17-19(SDM), |
| #Pages | 3 |
| Date of Issue | 2024-01-24 (SDM) |