| Presentation | 2023-11-30 Steam Oxidation Technique for Defect Reduction on ALD-Al2O3 Insulated-gate structures Shiro Ozaki, Yusuke Kumazaki, Naoya Okamoto, Yasuhiro Nakasya, Toshihiro Tagi, Naoki Hara, |
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| PDF Download Page |  PDF download Page Link |
| Abstract(in Japanese) | (See Japanese page) |
| Abstract(in English) | In this study, we investigated the effect of oxidant sources on carbon-related impurities in atomic layer deposited (ALD)-Al2O3 by focusing on plasma-induced decomposition of ?CH3 groups which attributed in ALD precursor. We found that the C?O bonds were detected in the ALD-Al2O3 using O2 plasma instead of the C?H bonds which attributed to ?CH3 groups of trimethylaluminum. It is considered that the decomposition of ?CH3 groups was enhanced by O2 plasma, and C?O residue was generated. We concluded that the decomposition of ?CH3 groups by oxidant sources must be suppressed to reduce the carbon-related impurities in ALD-Al2O3. |
| Keyword(in Japanese) | (See Japanese page) |
| Keyword(in English) | ALD-Al2O3 / oxidant Sources / carbon-related impurities / O2 plasma / H2O vapor |
| Paper # | ED2023-17,CPM2023-59,LQE2023-57 |
| Date of Issue | 2023-11-23 (ED, CPM, LQE) |
| Conference Information | |
| Committee | LQE / ED / CPM |
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| Conference Date | 2023/11/30(2days) |
| Place (in Japanese) | (See Japanese page) |
| Place (in English) | |
| Topics (in Japanese) | (See Japanese page) |
| Topics (in English) | |
| Chair | Kosuke Nishimura(KDDI Research) / Seiya Sakai(Hokkaido Univ.) / Hideki Nakazawa(Hirosaki Univ.) |
| Vice Chair | Atsushi Yamaguchi(Kanazawa Inst. of Tech.) / Manabu Arai(Nagoya Univ.) / Tomoaki Terasako(Ehime Univ.) |
| Secretary | Atsushi Yamaguchi(Fujitsu) / Manabu Arai(Yokohama National Univ.) / Tomoaki Terasako(Saga Univ.) |
| Assistant | Keita Mochiduki(Yokohama National Univ.) / Masatoshi Koyama(Osaka Inst. of Tech.) / Tomohiro Yoshida(SUMITOMO ELECTRIC DEVICE INNOVATIONS) / Yasuo Kimura(Tokyo Univ. of Tech.) / Fumihiko Hirose(Yamagata Univ.) / Yuichi Nakamura(Toyohashi Univ. of Tech.) |
| Paper Information | |
| Registration To | Technical Committee on Lasers and Quantum Electronics / Technical Committee on Electron Devices / Technical Committee on Component Parts and Materials |
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| Language | JPN |
| Title (in Japanese) | (See Japanese page) |
| Sub Title (in Japanese) | (See Japanese page) |
| Title (in English) | Steam Oxidation Technique for Defect Reduction on ALD-Al2O3 Insulated-gate structures |
| Sub Title (in English) | |
| Keyword(1) | ALD-Al2O3 |
| Keyword(2) | oxidant Sources |
| Keyword(3) | carbon-related impurities |
| Keyword(4) | O2 plasma |
| Keyword(5) | H2O vapor |
| 1st Author's Name | Shiro Ozaki |
| 1st Author's Affiliation | Fujitsu Ltd.(Fujitsu) |
| 2nd Author's Name | Yusuke Kumazaki |
| 2nd Author's Affiliation | Fujitsu Ltd.(Fujitsu) |
| 3rd Author's Name | Naoya Okamoto |
| 3rd Author's Affiliation | Fujitsu Ltd.(Fujitsu) |
| 4th Author's Name | Yasuhiro Nakasya |
| 4th Author's Affiliation | Fujitsu Ltd.(Fujitsu) |
| 5th Author's Name | Toshihiro Tagi |
| 5th Author's Affiliation | Fujitsu Ltd.(Fujitsu) |
| 6th Author's Name | Naoki Hara |
| 6th Author's Affiliation | Fujitsu Ltd.(Fujitsu) |
| Date | 2023-11-30 |
| Paper # | ED2023-17,CPM2023-59,LQE2023-57 |
| Volume (vol) | vol.123 |
| Number (no) | ED-288,CPM-289,LQE-290 |
| Page | pp.pp.15-20(ED), pp.15-20(CPM), pp.15-20(LQE), |
| #Pages | 6 |
| Date of Issue | 2023-11-23 (ED, CPM, LQE) |