Presentation 2023-11-30
Two-dimensional characterization of Au/Ni/thin heavily-Mg-doped p-GaN/n-GaN Schottky contacts under applied voltage by scanning internal photoemission microscopy
Haruto Yoshimura, Hiroki Imabayashi, Fumimasa Horikiri, Yoshinobu Narita, Hajime Fujikura, Hiroshi Ohta, Tomoyoshi Mishima, Kenji Shiojima,
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Abstract(in Japanese) (See Japanese page)
Abstract(in English) We applied scanning internal photoemission microscopy (SIPM) method to clarify the two-dimensional basic characteristics of the Au/Ni/thin heavily-Mg-doped p-GaN/n-GaN Schottky contacts as a simplified structure of a junction barrier Schottky diode. A 25-times larger photocurrent-signal with a lock-in phase shift of 180° was detected on the electrode periphery than that in the electrode center in the SIPM results. Combining with photocurrent-spectra measurements, a lateral distribution of the Ni/p-GaN interface was responsible for the large signal. We could detect the individual current transport mechanism on the electrode peripheries by two-dimensional characterization using the SIPM method.
Keyword(in Japanese) (See Japanese page)
Keyword(in English) GaN / Schottky contact / scanning internal photoemission microscopy
Paper # ED2023-18,CPM2023-60,LQE2023-58
Date of Issue 2023-11-23 (ED, CPM, LQE)

Conference Information
Committee LQE / ED / CPM
Conference Date 2023/11/30(2days)
Place (in Japanese) (See Japanese page)
Place (in English)
Topics (in Japanese) (See Japanese page)
Topics (in English)
Chair Kosuke Nishimura(KDDI Research) / Seiya Sakai(Hokkaido Univ.) / Hideki Nakazawa(Hirosaki Univ.)
Vice Chair Atsushi Yamaguchi(Kanazawa Inst. of Tech.) / Manabu Arai(Nagoya Univ.) / Tomoaki Terasako(Ehime Univ.)
Secretary Atsushi Yamaguchi(Fujitsu) / Manabu Arai(Yokohama National Univ.) / Tomoaki Terasako(Saga Univ.)
Assistant Keita Mochiduki(Yokohama National Univ.) / Masatoshi Koyama(Osaka Inst. of Tech.) / Tomohiro Yoshida(SUMITOMO ELECTRIC DEVICE INNOVATIONS) / Yasuo Kimura(Tokyo Univ. of Tech.) / Fumihiko Hirose(Yamagata Univ.) / Yuichi Nakamura(Toyohashi Univ. of Tech.)

Paper Information
Registration To Technical Committee on Lasers and Quantum Electronics / Technical Committee on Electron Devices / Technical Committee on Component Parts and Materials
Language JPN
Title (in Japanese) (See Japanese page)
Sub Title (in Japanese) (See Japanese page)
Title (in English) Two-dimensional characterization of Au/Ni/thin heavily-Mg-doped p-GaN/n-GaN Schottky contacts under applied voltage by scanning internal photoemission microscopy
Sub Title (in English)
Keyword(1) GaN
Keyword(2) Schottky contact
Keyword(3) scanning internal photoemission microscopy
1st Author's Name Haruto Yoshimura
1st Author's Affiliation Fukui University(Fukui univ.)
2nd Author's Name Hiroki Imabayashi
2nd Author's Affiliation Fukui University(Fukui univ.)
3rd Author's Name Fumimasa Horikiri
3rd Author's Affiliation Sumitomo Chemical Company(Sumitomo Chem.)
4th Author's Name Yoshinobu Narita
4th Author's Affiliation Sumitomo Chemical Company(Sumitomo Chem.)
5th Author's Name Hajime Fujikura
5th Author's Affiliation Sumitomo Chemical Company(Sumitomo Chem.)
6th Author's Name Hiroshi Ohta
6th Author's Affiliation Hosei university(Hosei Univ.)
7th Author's Name Tomoyoshi Mishima
7th Author's Affiliation Hosei university(Hosei Univ.)
8th Author's Name Kenji Shiojima
8th Author's Affiliation Fukui University(Fukui univ.)
Date 2023-11-30
Paper # ED2023-18,CPM2023-60,LQE2023-58
Volume (vol) vol.123
Number (no) ED-288,CPM-289,LQE-290
Page pp.pp.21-24(ED), pp.21-24(CPM), pp.21-24(LQE),
#Pages 4
Date of Issue 2023-11-23 (ED, CPM, LQE)