Presentation 2023-08-01
Fabrication of SiC/AlN multilayer structure on 3? off-axis Si(110) substrate and graphene formation thereon
Ryosuke Saito, Yuki Nara, Daiki Kasai, Haruto Koriyama, Yoshiharu Enta, Hideki Nakazawa,
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Abstract(in Japanese) (See Japanese page)
Abstract(in English) We have grown aluminum nitride (AlN) films on 3 ?off-axis Si(110) substrates by pulsed laser deposition (PLD) and formed SiC low-temperature buffer layers on the AlN layers by ultralow pressure chemical vapor deposition using monomethylsilane (MMS; CH3SiH3) to grow SiC films on the buffer layers by PLD. We optimized the substrate temperature and MMS pressure for formation of the buffer layers to improve the crystallinity and surface roughness of the SiC films. Furthermore, graphene was formed on the SiC films on the buffer layers formed under the optimized conditions by high- temperature annealing in vacuum. X-ray photoelectron spectroscopy and Raman spectroscopy were used to evaluate the crystallinity and determine the number of layers of graphene. Annealing at 1200 ?C for 30 min resulted in the formation of 4-5 layers of graphene. It was found that employing the SiC buffer layer formed under the optimized conditions increased the growth rate of graphene, which was much higher than those of graphene on Si(110) substrates.
Keyword(in Japanese) (See Japanese page)
Keyword(in English) Graphene / Silicon carbide / Aluminum nitride / Pulsed laser deposition / Heteroepitaxy
Paper # CPM2023-19
Date of Issue 2023-07-24 (CPM)

Conference Information
Committee CPM
Conference Date 2023/7/31(2days)
Place (in Japanese) (See Japanese page)
Place (in English)
Topics (in Japanese) (See Japanese page)
Topics (in English)
Chair Hideki Nakazawa(Hirosaki Univ.)
Vice Chair Tomoaki Terasako(Ehime Univ.)
Secretary Tomoaki Terasako(Shinshu Univ.)
Assistant Yasuo Kimura(Tokyo Univ. of Tech.) / Fumihiko Hirose(Yamagata Univ.) / Yuichi Nakamura(Toyohashi Univ. of Tech.)

Paper Information
Registration To Technical Committee on Component Parts and Materials
Language JPN
Title (in Japanese) (See Japanese page)
Sub Title (in Japanese) (See Japanese page)
Title (in English) Fabrication of SiC/AlN multilayer structure on 3? off-axis Si(110) substrate and graphene formation thereon
Sub Title (in English)
Keyword(1) Graphene
Keyword(2) Silicon carbide
Keyword(3) Aluminum nitride
Keyword(4) Pulsed laser deposition
Keyword(5) Heteroepitaxy
1st Author's Name Ryosuke Saito
1st Author's Affiliation Hirosaki University(Hirosaki Univ.)
2nd Author's Name Yuki Nara
2nd Author's Affiliation Hirosaki University(Hirosaki Univ.)
3rd Author's Name Daiki Kasai
3rd Author's Affiliation Hirosaki University(Hirosaki Univ.)
4th Author's Name Haruto Koriyama
4th Author's Affiliation Hirosaki University(Hirosaki Univ.)
5th Author's Name Yoshiharu Enta
5th Author's Affiliation Hirosaki University(Hirosaki Univ.)
6th Author's Name Hideki Nakazawa
6th Author's Affiliation Hirosaki University(Hirosaki Univ.)
Date 2023-08-01
Paper # CPM2023-19
Volume (vol) vol.123
Number (no) CPM-142
Page pp.pp.29-32(CPM),
#Pages 4
Date of Issue 2023-07-24 (CPM)