Presentation | 2023-04-22 [Invited Talk] Metal induced lateral crystallization of amorphous Ge on insulating substrate Isao Tsunoda, Kenichiro Takakura, |
---|---|
PDF Download Page | PDF download Page Link |
Abstract(in Japanese) | (See Japanese page) |
Abstract(in English) | We have investigated the low-temperature metal induced lateral crystallization of amorphous Ge on insulating substrate. Metal induced lateral crystallization is caused after catalytic metal atom diffusion into amorphous Ge. In order to enhance the metal induced lateral crystallization, we examined the Ge-Ge bond strength of amorphous Ge modulated by using electron irradiation and compressive residual stress in TEOS-SiO2. As a result, the Au induced lateral crystallization of amorphous Ge was significantly enhanced (~ 10 times). This study proposes a unique low temperature crystallization technique that introduces electron irradiation and residual stress on Au induced lateral crystallization. |
Keyword(in Japanese) | (See Japanese page) |
Keyword(in English) | Germanium / Solid phase crystallization / Metal induced lateral crystallization / Electron beam irradiation / Compressive stress stimulation |
Paper # | SDM2023-15,OME2023-15 |
Date of Issue | 2023-04-14 (SDM, OME) |
Conference Information | |
Committee | SDM / OME |
---|---|
Conference Date | 2023/4/21(2days) |
Place (in Japanese) | (See Japanese page) |
Place (in English) | Okinawaken Seinen Kaikan |
Topics (in Japanese) | (See Japanese page) |
Topics (in English) | Thin film devices (Si, compound, organic, flexible), Biotechnology, Materials, Characterization, etc. |
Chair | Shunichiro Ohmi(Tokyo Inst. of Tech.) / Toshiki Yamada(NICT) |
Vice Chair | Tatsuya Usami(ASM Japan) / Eiji Itoh(Shinshu Univ.) |
Secretary | Tatsuya Usami(Tohoku Univ.) / Eiji Itoh(Panasonic) |
Assistant | Takuji Hosoi(Kwansei Gakuin Univ.) / Takuya Futase(SanDisk) / Yoshiyuki Seike(Aichi Inst. of Tech.) / Akira Baba(Niigata Univ.) |
Paper Information | |
Registration To | Technical Committee on Silicon Device and Materials / Technical Committee on Organic Molecular Electronics |
---|---|
Language | JPN |
Title (in Japanese) | (See Japanese page) |
Sub Title (in Japanese) | (See Japanese page) |
Title (in English) | [Invited Talk] Metal induced lateral crystallization of amorphous Ge on insulating substrate |
Sub Title (in English) | |
Keyword(1) | Germanium |
Keyword(2) | Solid phase crystallization |
Keyword(3) | Metal induced lateral crystallization |
Keyword(4) | Electron beam irradiation |
Keyword(5) | Compressive stress stimulation |
1st Author's Name | Isao Tsunoda |
1st Author's Affiliation | National Institute of Technology, Kumamoto College(NIT, Kumamoto College) |
2nd Author's Name | Kenichiro Takakura |
2nd Author's Affiliation | National Institute of Technology, Kumamoto College(NIT, Kumamoto College) |
Date | 2023-04-22 |
Paper # | SDM2023-15,OME2023-15 |
Volume (vol) | vol.123 |
Number (no) | SDM-8,OME-9 |
Page | pp.pp.55-58(SDM), pp.55-58(OME), |
#Pages | 4 |
Date of Issue | 2023-04-14 (SDM, OME) |