| Presentation | 2023-04-22 [Invited Talk] Crystallization technology of Si thin film by excimer laser annealing Hiroyuki Kuriyama, |
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| PDF Download Page |  PDF download Page Link |
| Abstract(in Japanese) | (See Japanese page) |
| Abstract(in English) | Si thin film crystallization technology using an excimer laser was first put into practical use in 1996 as a core technology for low-temperature polysilicon (LTPS) liquid crystal displays used in smartphones etc. through collaboration between SANYO Electric Co., Ltd and Sony Corporation. More than 30 years ago, aiming for early commercialization from basic research to applied research, I worked on the extensive research of Si thin film crystallization by excimer laser annealing, such as enlargement of grain size by melted Si solidification control, orientation control and uniformity improvement etc. I hope that this review of past my research approaches will be of some use to the further development of research in this field, and that it will serve as a source of wisdom from the past. |
| Keyword(in Japanese) | (See Japanese page) |
| Keyword(in English) | Excimer laser / Crystallization / Si thin film / Grain size / Orientation control / TFT / Display / OLED |
| Paper # | SDM2023-13,OME2023-13 |
| Date of Issue | 2023-04-14 (SDM, OME) |
| Conference Information | |
| Committee | SDM / OME |
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| Conference Date | 2023/4/21(2days) |
| Place (in Japanese) | (See Japanese page) |
| Place (in English) | Okinawaken Seinen Kaikan |
| Topics (in Japanese) | (See Japanese page) |
| Topics (in English) | Thin film devices (Si, compound, organic, flexible), Biotechnology, Materials, Characterization, etc. |
| Chair | Shunichiro Ohmi(Tokyo Inst. of Tech.) / Toshiki Yamada(NICT) |
| Vice Chair | Tatsuya Usami(ASM Japan) / Eiji Itoh(Shinshu Univ.) |
| Secretary | Tatsuya Usami(Tohoku Univ.) / Eiji Itoh(Panasonic) |
| Assistant | Takuji Hosoi(Kwansei Gakuin Univ.) / Takuya Futase(SanDisk) / Yoshiyuki Seike(Aichi Inst. of Tech.) / Akira Baba(Niigata Univ.) |
| Paper Information | |
| Registration To | Technical Committee on Silicon Device and Materials / Technical Committee on Organic Molecular Electronics |
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| Language | JPN |
| Title (in Japanese) | (See Japanese page) |
| Sub Title (in Japanese) | (See Japanese page) |
| Title (in English) | [Invited Talk] Crystallization technology of Si thin film by excimer laser annealing |
| Sub Title (in English) | Hoping to become some lesson from the past |
| Keyword(1) | Excimer laser |
| Keyword(2) | Crystallization |
| Keyword(3) | Si thin film |
| Keyword(4) | Grain size |
| Keyword(5) | Orientation control |
| Keyword(6) | TFT |
| Keyword(7) | Display |
| Keyword(8) | OLED |
| 1st Author's Name | Hiroyuki Kuriyama |
| 1st Author's Affiliation | Takasago Thermal Engineering Co.,Ltd.(TTE) |
| Date | 2023-04-22 |
| Paper # | SDM2023-13,OME2023-13 |
| Volume (vol) | vol.123 |
| Number (no) | SDM-8,OME-9 |
| Page | pp.pp.48-51(SDM), pp.48-51(OME), |
| #Pages | 4 |
| Date of Issue | 2023-04-14 (SDM, OME) |