Presentation 2023-03-03
Explainable Deep Clustering for Wafer Defect Pattern Classification
Yuki Okazaki, Hiroki Takahashi,
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Abstract(in Japanese) (See Japanese page)
Abstract(in English) Classification of specific defect patterns on semiconductor wafers is important in manufacturing processes. Recently, many classification methods based on clustering have been proposed. However, it is unclear whether generated clusters have high visual validity that captures features of defect patterns. This paper proposes Explainable Deep Clustering (EDC), which uses deep learning to perform explainable clustering. EDC generates clusters of wafer maps with similar defect patterns. Moreover, each cluster is explained using statistical features. Besides, the analysis results are fed back to the clustering to improve the clusters. The experimental results show that the proposed method generates clusters with high visual validity and performs highly accurate classification. We also show the explainability of the cluster features.
Keyword(in Japanese) (See Japanese page)
Keyword(in English) Wafer Map Defects / Clustering / Deep Clustering / Explainable
Paper # PRMU2022-115,IBISML2022-122
Date of Issue 2023-02-23 (PRMU, IBISML)

Conference Information
Committee PRMU / IBISML / IPSJ-CVIM
Conference Date 2023/3/2(2days)
Place (in Japanese) (See Japanese page)
Place (in English) Future University Hakodate
Topics (in Japanese) (See Japanese page)
Topics (in English)
Chair Seiichi Uchida(Kyushu Univ.) / Masashi Sugiyama(Univ. of Tokyo)
Vice Chair Takuya Funatomi(NAIST) / Mitsuru Anpai(Denso IT Lab.) / Toshihiro Kamishima(AIST) / Koji Tsuda(Univ. of Tokyo)
Secretary Takuya Funatomi(CyberAgent) / Mitsuru Anpai(Univ. of Tokyo) / Toshihiro Kamishima(NTT) / Koji Tsuda(Hokkaido Univ.)
Assistant Nakamasa Inoue(Tokyo Inst. of Tech.) / Yasutomo Kawanishi(Riken) / Yoshinobu Kawahara(Osaka Univ.) / Taiji Suzuki(Tokyo Inst. of Tech.)

Paper Information
Registration To Technical Committee on Pattern Recognition and Media Understanding / Technical Committee on Information-Based Induction Sciences and Machine Learning / Special Interest Group on Computer Vision and Image Media
Language JPN
Title (in Japanese) (See Japanese page)
Sub Title (in Japanese) (See Japanese page)
Title (in English) Explainable Deep Clustering for Wafer Defect Pattern Classification
Sub Title (in English)
Keyword(1) Wafer Map Defects
Keyword(2) Clustering
Keyword(3) Deep Clustering
Keyword(4) Explainable
1st Author's Name Yuki Okazaki
1st Author's Affiliation The University of Electro-Communications(The Univ. of Electro-Communications)
2nd Author's Name Hiroki Takahashi
2nd Author's Affiliation The University of Electro-Communications(The Univ. of Electro-Communications)
Date 2023-03-03
Paper # PRMU2022-115,IBISML2022-122
Volume (vol) vol.122
Number (no) PRMU-404,IBISML-405
Page pp.pp.299-304(PRMU), pp.299-304(IBISML),
#Pages 6
Date of Issue 2023-02-23 (PRMU, IBISML)