Presentation 2023-01-27
Low - pressure CVD of hexagonal BN thin films at high temperatures
Taiki Oishi, Taira Watanabe, Yuki Tanaka, Katsumi Masuda, Riku Yoshioka, Kirari Masuda, Hiroko Kominami, Kazuhiko Hara,
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Abstract(in Japanese) (See Japanese page)
Abstract(in English) To further improve quality of hexagonal boron nitride (h-BN) thin films grown on c-plane sapphire by a low - pressure chemical vapor deposition (CVD) method with BCl? and NH?, we have optimized the growth conditions at higher growth temperatures, Tg, than before. At Tg = 1300 ℃, optimizing the NH? flow rate significantly improved the luminescence property compared to those grow at 1200 ℃. At Tg = 1400 ℃, the luminescence property was most improved at growth pressure, Pg = 7.5 kPa, which is lower than the optimal Pg of 15 kPa at 1200 and 1300 ℃. However, the improvement of film quality was not achieved at Tg = 1400 ℃. At even higher Tg, the growth conditions need to be further investigated.
Keyword(in Japanese) (See Japanese page)
Keyword(in English) hexagonal boron nitride / CVD / thin film / excitonic luminescence
Paper # EID2022-8
Date of Issue 2023-01-19 (EID)

Conference Information
Committee ITE-IDY / IEIJ-SSL / EID / SID-JC / IEE-EDD
Conference Date 2023/1/26(2days)
Place (in Japanese) (See Japanese page)
Place (in English) Online (Zoom)
Topics (in Japanese) (See Japanese page)
Topics (in English)
Chair Takahiro Ishinabe(Tohoku Univ.) / / Masahiro Yamaguchi(Tokyo Inst. of Tech.)
Vice Chair / / Masayuki Kanbara(NAIST) / Tomoyuki Ishihara(Japan Display)
Secretary (Shizuoka Univ.) / (Tohoku Univ.) / Masayuki Kanbara / Tomoyuki Ishihara(NTT) / (SHARP)
Assistant / / Hiroshi Tsuji(NHK) / Mutsumi Kimura(Ryukoku Univ.) / Tomokazu Shiga(Univ. of Electro-Comm.) / Hiroko Kominami(Shizuoka Univ.) / Rumiko Yamaguchi(Akita Univ.) / Mitsuhiro Akimoto(Sanyo-Onoda City Univ)

Paper Information
Registration To Technical Group on Information Display / * / Technical Committee on Electronic Information Displays / Society for Informtion Display Japan Chapter / Technical Group on Electron Devices
Language JPN
Title (in Japanese) (See Japanese page)
Sub Title (in Japanese) (See Japanese page)
Title (in English) Low - pressure CVD of hexagonal BN thin films at high temperatures
Sub Title (in English)
Keyword(1) hexagonal boron nitride
Keyword(2) CVD
Keyword(3) thin film
Keyword(4) excitonic luminescence
1st Author's Name Taiki Oishi
1st Author's Affiliation Shizuoka University(Shizuoka Univ.)
2nd Author's Name Taira Watanabe
2nd Author's Affiliation Shizuoka University(Shizuoka Univ.)
3rd Author's Name Yuki Tanaka
3rd Author's Affiliation Shizuoka University(Shizuoka Univ.)
4th Author's Name Katsumi Masuda
4th Author's Affiliation Shizuoka University(Shizuoka Univ.)
5th Author's Name Riku Yoshioka
5th Author's Affiliation Shizuoka University(Shizuoka Univ.)
6th Author's Name Kirari Masuda
6th Author's Affiliation Shizuoka University(Shizuoka Univ.)
7th Author's Name Hiroko Kominami
7th Author's Affiliation Shizuoka University(Shizuoka Univ.)
8th Author's Name Kazuhiko Hara
8th Author's Affiliation Shizuoka University(Shizuoka Univ.)
Date 2023-01-27
Paper # EID2022-8
Volume (vol) vol.122
Number (no) EID-366
Page pp.pp.17-20(EID),
#Pages 4
Date of Issue 2023-01-19 (EID)