| Presentation | 2022-11-24 Semiconducting properties of electrochemically deposited Ni(OH)2 thin films Masahide Shimura, Koji Abe, |
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| PDF Download Page |  PDF download Page Link |
| Abstract(in Japanese) | (See Japanese page) |
| Abstract(in English) | Abstract Metal hydroxides are important inorganic materials used as flame retardants and precursors for metal oxide synthesis, and most of them can be prepared at relatively low temperatures using simple equipment such as electrochemical deposition and sol-gel methods. Nickel hydroxide (Ni(OH)$_2$) is a transparent material and is expected to be applied as a layered double hydroxide due to its crystal structure. However, there are few reports on its use as an electronic material, and its semiconducting properties are not clear yet. In this study, Ni(OH)$_2$ films were prepared by electrochemical deposition and their properties as semiconductors were investigated. After annealing in water vapor, the Ni(OH)$_2$ film was crystalized, and the conduction type of the film was n-type. n-Ni(OH)$_2$/p-NiO heterodiodes showed clear rectification characteristics. |
| Keyword(in Japanese) | (See Japanese page) |
| Keyword(in English) | nickel hydroxide / nickel oxide / heterojunction / electrochemical deposition |
| Paper # | ED2022-28,CPM2022-53,LQE2022-61 |
| Date of Issue | 2022-11-17 (ED, CPM, LQE) |
| Conference Information | |
| Committee | CPM / ED / LQE |
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| Conference Date | 2022/11/24(2days) |
| Place (in Japanese) | (See Japanese page) |
| Place (in English) | Winc Aichi (Aichi Industry & Labor Center) |
| Topics (in Japanese) | (See Japanese page) |
| Topics (in English) | |
| Chair | Yuichi Nakamura(Toyohashi Univ. of Tech.) / Hiroki Fujishiro(Tokyo Univ. of Science) / Junichi Takahara(Osaka Univ.) |
| Vice Chair | Hideki Nakazawa(Hirosaki Univ.) / Seiya Sakai(Hokkaido Univ.) / Kosuke Nishimura(KDDI Research) |
| Secretary | Hideki Nakazawa(Ehime Univ.) / Seiya Sakai(Kitami Inst. of Tech) / Kosuke Nishimura(Saga Univ.) |
| Assistant | Yasuo Kimura(Tokyo Univ. of Tech.) / Fumihiko Hirose(Yamagata Univ.) / Noriko Bamba(Shinshu Univ.) / Masatoshi Koyama(Osaka Inst. of Tech.) / Yoshitugu Yamamoto(Mitsubishi Electric) / Yoshiaki Nishijima(Yokohama National Univ.) / Nobuhiko Nishiyama(Tokyo Inst. of Tech.) |
| Paper Information | |
| Registration To | Technical Committee on Component Parts and Materials / Technical Committee on Electron Devices / Technical Committee on Lasers and Quantum Electronics |
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| Language | JPN |
| Title (in Japanese) | (See Japanese page) |
| Sub Title (in Japanese) | (See Japanese page) |
| Title (in English) | Semiconducting properties of electrochemically deposited Ni(OH)2 thin films |
| Sub Title (in English) | |
| Keyword(1) | nickel hydroxide |
| Keyword(2) | nickel oxide |
| Keyword(3) | heterojunction |
| Keyword(4) | electrochemical deposition |
| 1st Author's Name | Masahide Shimura |
| 1st Author's Affiliation | Nagoya Institute of Technology(Nitech) |
| 2nd Author's Name | Koji Abe |
| 2nd Author's Affiliation | Nagoya Institute of Technology(Nitech) |
| Date | 2022-11-24 |
| Paper # | ED2022-28,CPM2022-53,LQE2022-61 |
| Volume (vol) | vol.122 |
| Number (no) | ED-271,CPM-272,LQE-273 |
| Page | pp.pp.23-26(ED), pp.23-26(CPM), pp.23-26(LQE), |
| #Pages | 4 |
| Date of Issue | 2022-11-17 (ED, CPM, LQE) |