Presentation 2022-11-10
[Invited Talk] Progress in CMOS Device Technology and IRDS Roadmap
Hitoshi Wakabayashi,
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Abstract(in Japanese) (See Japanese page)
Abstract(in English)
Keyword(in Japanese) (See Japanese page)
Keyword(in English)
Paper # SDM2022-64
Date of Issue 2022-11-03 (SDM)

Conference Information
Committee SDM
Conference Date 2022/11/10(2days)
Place (in Japanese) (See Japanese page)
Place (in English) Online
Topics (in Japanese) (See Japanese page)
Topics (in English) Process, Device, Circuit simulation, etc.
Chair Shunichiro Ohmi(Tokyo Inst. of Tech.)
Vice Chair Tatsuya Usami(ASM Japan)
Secretary Tatsuya Usami(Tohoku Univ.)
Assistant Takuji Hosoi(Kwansei Gakuin Univ.) / Takuya Futase(SanDisk)

Paper Information
Registration To Technical Committee on Silicon Device and Materials
Language JPN
Title (in Japanese) (See Japanese page)
Sub Title (in Japanese) (See Japanese page)
Title (in English) [Invited Talk] Progress in CMOS Device Technology and IRDS Roadmap
Sub Title (in English)
Keyword(1)
1st Author's Name Hitoshi Wakabayashi
1st Author's Affiliation Tokyo Institute of Technology(Tokyo Tech)
Date 2022-11-10
Paper # SDM2022-64
Volume (vol) vol.122
Number (no) SDM-247
Page pp.pp.1-6(SDM),
#Pages 6
Date of Issue 2022-11-03 (SDM)