| Presentation | 2022-11-30 A fast SRAF optimization used LUT based intensity estimation Sota Saito, Atsushi Takahashi, |
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| PDF Download Page |  PDF download Page Link |
| Abstract(in Japanese) | (See Japanese page) |
| Abstract(in English) | Recent advances in technology nodes have led to problems in optical lithography such as reduced fidelity of transferred patterns and reduced robustness against process variations. However, the computation time required for OPC (Optical Proximity Correction) is large, and OPC that can achieve high fidelity and high process variation tolerance in short computation time is required. In this paper, we focus on SRAF (Sub Resolution Assisting Feature) and propose a method for fast optimization of SRAF using LUT based point intensity calculation. |
| Keyword(in Japanese) | (See Japanese page) |
| Keyword(in English) | computational lithography / RET / OPC / SRAF / PV band / Gradient descent |
| Paper # | VLD2022-40,ICD2022-57,DC2022-56,RECONF2022-63 |
| Date of Issue | 2022-11-21 (VLD, ICD, DC, RECONF) |
| Conference Information | |
| Committee | VLD / DC / RECONF / ICD / IPSJ-SLDM |
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| Conference Date | 2022/11/28(3days) |
| Place (in Japanese) | (See Japanese page) |
| Place (in English) | Kanazawa Bunka Hall |
| Topics (in Japanese) | (See Japanese page) |
| Topics (in English) | Design Gaia 2022 -New Field of VLSI Design- |
| Chair | Minako Ikeda(NTT) / Tatsuhiro Tsuchiya(Osaka Univ.) / Kentaro Sano(RIKEN) / Masafumi Takahashi(Kioxia) / Hiroyuki Ochi(Ritsumeikan Univ.) |
| Vice Chair | Shigetoshi Nakatake(Univ. of Kitakyushu) / Toshinori Hosokawa(Nihon Univ.) / Yoshiki Yamaguchi(Tsukuba Univ.) / Tomonori Izumi(Ritsumeikan Univ.) / Makoto Ikeda(Univ. of Tokyo) |
| Secretary | Shigetoshi Nakatake(NBS) / Toshinori Hosokawa(Hirosaki Univ.) / Yoshiki Yamaguchi(Nihon Univ.) / Tomonori Izumi(Chiba Univ.) / Makoto Ikeda(NEC) / (Toyohashi Univ. of Tech.) |
| Assistant | Takuma Nishimoto(Hitachi) / / Yukitaka Takemura(INTEL) / Yasunori Osana(Ryukyu Univ.) / Yoshiaki Yoshihara(KIOXIA) / Jun Shiomi(Osaka Univ.) / Takeshi Kuboki(Sony Semiconductor Solutions) |
| Paper Information | |
| Registration To | Technical Committee on VLSI Design Technologies / Technical Committee on Dependable Computing / Technical Committee on Reconfigurable Systems / Technical Committee on Integrated Circuits and Devices / Special Interest Group on System and LSI Design Methodology |
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| Language | JPN |
| Title (in Japanese) | (See Japanese page) |
| Sub Title (in Japanese) | (See Japanese page) |
| Title (in English) | A fast SRAF optimization used LUT based intensity estimation |
| Sub Title (in English) | |
| Keyword(1) | computational lithography |
| Keyword(2) | RET |
| Keyword(3) | OPC |
| Keyword(4) | SRAF |
| Keyword(5) | PV band |
| Keyword(6) | Gradient descent |
| 1st Author's Name | Sota Saito |
| 1st Author's Affiliation | Tokyo Institute of Technology(Tokyo Tech) |
| 2nd Author's Name | Atsushi Takahashi |
| 2nd Author's Affiliation | Tokyo Institute of Technology(Tokyo Tech) |
| Date | 2022-11-30 |
| Paper # | VLD2022-40,ICD2022-57,DC2022-56,RECONF2022-63 |
| Volume (vol) | vol.122 |
| Number (no) | VLD-283,ICD-284,DC-285,RECONF-286 |
| Page | pp.pp.121-126(VLD), pp.121-126(ICD), pp.121-126(DC), pp.121-126(RECONF), |
| #Pages | 6 |
| Date of Issue | 2022-11-21 (VLD, ICD, DC, RECONF) |