| Presentation | 2022-11-30 Mask Optimization Using Voronoi Partition and Iterative Improvement Naoki Nonaka, Yukihide Kohira, Atsushi Takahashi, Chikaaki Kodama, |
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| PDF Download Page |  PDF download Page Link |
| Abstract(in Japanese) | (See Japanese page) |
| Abstract(in English) | To realize continuously scaling down technology node, progressing manufacturing process by optical lithography is required. In resolution enhancement techniques in the optical lithography, Optical Proximity Correction (OPC), which improves shape fidelity of formed patterns on wafers to designed target patterns by mask optimization, is essential to progress the optical lithography. In this paper, we propose a mask optimization by Voronoi partition and iterative improvement. The mask region is divided by Voronoi partition and one parameter is defined for each region. The shape of mask pattern is determined by adjusting these parameters in the iterative improvement. Experiments show that the quality of the mask shape obtained by the proposed method is not degraded significantly and that the reduction of variables in the optimization reduces the execution time. |
| Keyword(in Japanese) | (See Japanese page) |
| Keyword(in English) | optical lithography / mask optimization / Optical Proximity Correction (OPC) / Voronoi partition |
| Paper # | VLD2022-41,ICD2022-58,DC2022-57,RECONF2022-64 |
| Date of Issue | 2022-11-21 (VLD, ICD, DC, RECONF) |
| Conference Information | |
| Committee | VLD / DC / RECONF / ICD / IPSJ-SLDM |
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| Conference Date | 2022/11/28(3days) |
| Place (in Japanese) | (See Japanese page) |
| Place (in English) | Kanazawa Bunka Hall |
| Topics (in Japanese) | (See Japanese page) |
| Topics (in English) | Design Gaia 2022 -New Field of VLSI Design- |
| Chair | Minako Ikeda(NTT) / Tatsuhiro Tsuchiya(Osaka Univ.) / Kentaro Sano(RIKEN) / Masafumi Takahashi(Kioxia) / Hiroyuki Ochi(Ritsumeikan Univ.) |
| Vice Chair | Shigetoshi Nakatake(Univ. of Kitakyushu) / Toshinori Hosokawa(Nihon Univ.) / Yoshiki Yamaguchi(Tsukuba Univ.) / Tomonori Izumi(Ritsumeikan Univ.) / Makoto Ikeda(Univ. of Tokyo) |
| Secretary | Shigetoshi Nakatake(NBS) / Toshinori Hosokawa(Hirosaki Univ.) / Yoshiki Yamaguchi(Nihon Univ.) / Tomonori Izumi(Chiba Univ.) / Makoto Ikeda(NEC) / (Toyohashi Univ. of Tech.) |
| Assistant | Takuma Nishimoto(Hitachi) / / Yukitaka Takemura(INTEL) / Yasunori Osana(Ryukyu Univ.) / Yoshiaki Yoshihara(KIOXIA) / Jun Shiomi(Osaka Univ.) / Takeshi Kuboki(Sony Semiconductor Solutions) |
| Paper Information | |
| Registration To | Technical Committee on VLSI Design Technologies / Technical Committee on Dependable Computing / Technical Committee on Reconfigurable Systems / Technical Committee on Integrated Circuits and Devices / Special Interest Group on System and LSI Design Methodology |
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| Language | JPN |
| Title (in Japanese) | (See Japanese page) |
| Sub Title (in Japanese) | (See Japanese page) |
| Title (in English) | Mask Optimization Using Voronoi Partition and Iterative Improvement |
| Sub Title (in English) | |
| Keyword(1) | optical lithography |
| Keyword(2) | mask optimization |
| Keyword(3) | Optical Proximity Correction (OPC) |
| Keyword(4) | Voronoi partition |
| 1st Author's Name | Naoki Nonaka |
| 1st Author's Affiliation | The University of Aizu(Univ. of Aizu) |
| 2nd Author's Name | Yukihide Kohira |
| 2nd Author's Affiliation | The University of Aizu(Univ. of Aizu) |
| 3rd Author's Name | Atsushi Takahashi |
| 3rd Author's Affiliation | Tokyo Institute of Technology(Tokyo Tech) |
| 4th Author's Name | Chikaaki Kodama |
| 4th Author's Affiliation | KIOXIA Corporation(KIOXIA) |
| Date | 2022-11-30 |
| Paper # | VLD2022-41,ICD2022-58,DC2022-57,RECONF2022-64 |
| Volume (vol) | vol.122 |
| Number (no) | VLD-283,ICD-284,DC-285,RECONF-286 |
| Page | pp.pp.127-132(VLD), pp.127-132(ICD), pp.127-132(DC), pp.127-132(RECONF), |
| #Pages | 6 |
| Date of Issue | 2022-11-21 (VLD, ICD, DC, RECONF) |