Presentation 2022-08-26
Fabrication of Wavelength-Selective Absorbing Filter for near ultraviolet and visible light by Surface Plasmon Resonance
Atsushi Motogaito, Seigi Shimizu, Karen Akatsuka, Ryoga Tanaka, Kazumasa Hiramatsu,
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Abstract(in Japanese) (See Japanese page)
Abstract(in English) In this study, we used a double-layer wire-grid structure to fabricate narrow-band, wavelength-selective plasmonic absorbers that depend on polarization in the short-wave visible and near-UV regions. Rigorous wave coupling analysis (RCWA) reveals that the maximum absorption achieved using Ag and Al is about 80-90% at 450, 405, and 375 nm. Experiments using Ag and Al yielded results like those predicted by simulations. These results show that polarization-dependent narrowband perfect plasmonic absorbers can be realized at 450, 405 and 375 nm using Ag or Al, demonstrating that this phenomenon can be explained by surface lattice resonance.
Keyword(in Japanese) (See Japanese page)
Keyword(in English) double-layer wire grid structure / surface plasmon resonance / wavelength-selective absorbing filter / surface lattice resonance
Paper # R2022-24,EMD2022-12,CPM2022-29,OPE2022-55,LQE2022-18
Date of Issue 2022-08-18 (R, EMD, CPM, OPE, LQE)

Conference Information
Committee EMD / R / LQE / OPE / CPM
Conference Date 2022/8/25(2days)
Place (in Japanese) (See Japanese page)
Place (in English)
Topics (in Japanese) (See Japanese page)
Topics (in English)
Chair Takahiro Ueno(Nippon Inst. of Tech.) / Tadashi Dohi(Hiroshima Univ.) / Junichi Takahara(Osaka Univ.) / Toshikazu Hashimoto(NTT) / Yuichi Nakamura(Toyohashi Univ. of Tech.)
Vice Chair / Yasushi Kadota(Ricoh) / Kosuke Nishimura(KDDI Research) / Taro Arakawa(Yokohama National Univ.) / Hideki Nakazawa(Hirosaki Univ.)
Secretary (NAIST) / Yasushi Kadota(Fujitsu Component) / Kosuke Nishimura(Hiroshima Univ.) / Taro Arakawa(Kansai Univ.) / Hideki Nakazawa(Fujitsu)
Assistant Yoshiki Kayano(Univ. of Electro-Comm.) / Shinji Yokogawa(Univ. of Electro-Comm.) / Takahide Yoshikawa(Fujitsu Lab.) / Takenori Sakumura(Housei Univ.) / Yoshiaki Nishijima(Yokohama National Univ.) / Nobuhiko Nishiyama(Tokyo Inst. of Tech.) / Yuhei Ishizaka(Kanto Gakuin Univ.) / Takeshi Umeki(NTT) / Yasuo Kimura(Tokyo Univ. of Tech.) / Fumihiko Hirose(Yamagata Univ.) / Noriko Bamba(Shinshu Univ.)

Paper Information
Registration To Technical Committee on Electromechanical Devices / Technical Committee on Reliability / Technical Committee on Lasers and Quantum Electronics / Technical Committee on OptoElectronics / Technical Committee on Component Parts and Materials
Language JPN
Title (in Japanese) (See Japanese page)
Sub Title (in Japanese) (See Japanese page)
Title (in English) Fabrication of Wavelength-Selective Absorbing Filter for near ultraviolet and visible light by Surface Plasmon Resonance
Sub Title (in English)
Keyword(1) double-layer wire grid structure
Keyword(2) surface plasmon resonance
Keyword(3) wavelength-selective absorbing filter
Keyword(4) surface lattice resonance
1st Author's Name Atsushi Motogaito
1st Author's Affiliation Mie University(Mie Univ.)
2nd Author's Name Seigi Shimizu
2nd Author's Affiliation Mie University(Mie Univ.)
3rd Author's Name Karen Akatsuka
3rd Author's Affiliation Mie University(Mie Univ.)
4th Author's Name Ryoga Tanaka
4th Author's Affiliation Mie University(Mie Univ.)
5th Author's Name Kazumasa Hiramatsu
5th Author's Affiliation Mie University(Mie Univ.)
Date 2022-08-26
Paper # R2022-24,EMD2022-12,CPM2022-29,OPE2022-55,LQE2022-18
Volume (vol) vol.122
Number (no) R-156,EMD-157,CPM-158,OPE-159,LQE-160
Page pp.pp.44-49(R), pp.44-49(EMD), pp.44-49(CPM), pp.44-49(OPE), pp.44-49(LQE),
#Pages 6
Date of Issue 2022-08-18 (R, EMD, CPM, OPE, LQE)