Presentation 2022-08-08
Evaluation of Steep Subthreshold Slope Device "Dual-gate type PN-body Tied SOI-FET" for Ultra-low Voltage Operation
Haruki Yonezaki, Jiro Ida, Takayuki Mori, Koichiro Ishibashi,
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Abstract(in Japanese) (See Japanese page)
Abstract(in English) In this study, we report the first prototype results of a Steep SS "Dual-Gate (DG) PN-Body Tied (PNBT) SOI-FET" for extremely low-voltage operation. In our laboratory, we have proposed a "PN-Body Tied (PNBT) SOI-FET" with a steep Subthreshold Slope (SS) to realize CMOS integrated circuits with extremely low power consumption. However, it has been found that the PNBT SOI-FET requires a body voltage of about 0.7 V or higher to obtain a steep SS. It is also known that leakage current flows during turn-off. To solve these problems, a new structure of "Dual-Gate (DG) type PNBT SOI-FET" was proposed in our laboratory. As a result, we confirmed steep SS even in the DG-type PNBT SOI-FET. It was also found that the 1st gate voltage, which triggers steep SS, can be controlled by the 2nd gate.
Keyword(in Japanese) (See Japanese page)
Keyword(in English) SOI-FET / Steep Subthreshold Slope
Paper # SDM2022-38,ICD2022-6
Date of Issue 2022-08-01 (SDM, ICD)

Conference Information
Committee ICD / SDM / ITE-IST
Conference Date 2022/8/8(3days)
Place (in Japanese) (See Japanese page)
Place (in English)
Topics (in Japanese) (See Japanese page)
Topics (in English) Analog, Mixed Analog and Digital, RF, and Sensor Interface, Low Voltage/Low Power Techniques, Novel Devices/Circuits, and the Applications
Chair Masafumi Takahashi(Kioxia) / Shunichiro Ohmi(Tokyo Inst. of Tech.) / 秋田 純一(金沢大)
Vice Chair Makoto Ikeda(Univ. of Tokyo) / Tatsuya Usami(ASM Japan) / 池辺 将之(北大) / 廣瀬 裕(パナソニック)
Secretary Makoto Ikeda(Shinshu Univ.) / Tatsuya Usami(TSMC) / 池辺 将之(Tohoku Univ.) / 廣瀬 裕(Panasonic)
Assistant Jun Shiomi(Osaka Univ.) / Yoshiaki Yoshihara(キオクシア) / Takeshi Kuboki(Sony Semiconductor Solutions) / Takuji Hosoi(Kwansei Gakuin Univ.) / Takuya Futase(SanDisk) / 山下 雄一郎(TSMC) / 大倉 俊介(立命館大) / 竹本 良章(メムスコア)

Paper Information
Registration To Technical Committee on Integrated Circuits and Devices / Technical Committee on Silicon Device and Materials / Technical Group on Information Sensing Technologies
Language JPN
Title (in Japanese) (See Japanese page)
Sub Title (in Japanese) (See Japanese page)
Title (in English) Evaluation of Steep Subthreshold Slope Device "Dual-gate type PN-body Tied SOI-FET" for Ultra-low Voltage Operation
Sub Title (in English)
Keyword(1) SOI-FET
Keyword(2) Steep Subthreshold Slope
1st Author's Name Haruki Yonezaki
1st Author's Affiliation Kanazawa Institute of Technology(KIT)
2nd Author's Name Jiro Ida
2nd Author's Affiliation Kanazawa Institute of Technology(KIT)
3rd Author's Name Takayuki Mori
3rd Author's Affiliation Kanazawa Institute of Technology(KIT)
4th Author's Name Koichiro Ishibashi
4th Author's Affiliation The University of Electro-Communications(UEC)
Date 2022-08-08
Paper # SDM2022-38,ICD2022-6
Volume (vol) vol.122
Number (no) SDM-148,ICD-149
Page pp.pp.17-20(SDM), pp.17-20(ICD),
#Pages 4
Date of Issue 2022-08-01 (SDM, ICD)