Presentation 2022-01-31
[Invited Talk] ****
Reika Ichihara,
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Abstract(in Japanese) (See Japanese page)
Abstract(in English) e establish an accurate picture of cycling degradation in HfO2-FeFET based on the dynamics of various charge-trapping revealed by fast charge centroid analysis. Cycling-induced fixed electron at HfO2/SiO2 interface induces an additional reversible hole-trapping leading to Vth window narrowing.
Keyword(in Japanese) (See Japanese page)
Keyword(in English) ferroelectric / HfO2 / FeFET / charge-trapping / spontaneous polarization / cycling degradation / Vth window
Paper # SDM2021-70
Date of Issue 2022-01-24 (SDM)

Conference Information
Committee SDM
Conference Date 2022/1/31(1days)
Place (in Japanese) (See Japanese page)
Place (in English) Online
Topics (in Japanese) (See Japanese page)
Topics (in English)
Chair Hiroshige Hirano(TowerPartners Semiconductor)
Vice Chair Shunichiro Ohmi(Tokyo Inst. of Tech.)
Secretary Shunichiro Ohmi(AIST)
Assistant Taiji Noda(Panasonic) / Tomoyuki Suwa(Tohoku Univ.)

Paper Information
Registration To Technical Committee on Silicon Device and Materials
Language JPN
Title (in Japanese) (See Japanese page)
Sub Title (in Japanese) (See Japanese page)
Title (in English) [Invited Talk] ****
Sub Title (in English)
Keyword(1) ferroelectric
Keyword(2) HfO2
Keyword(3) FeFET
Keyword(4) charge-trapping
Keyword(5) spontaneous polarization
Keyword(6) cycling degradation
Keyword(7) Vth window
1st Author's Name Reika Ichihara
1st Author's Affiliation Kioxia(Kioxia)
Date 2022-01-31
Paper # SDM2021-70
Volume (vol) vol.121
Number (no) SDM-365
Page pp.pp.9-11(SDM),
#Pages 3
Date of Issue 2022-01-24 (SDM)