| Presentation | 2021-11-26 Fabrication of Recessed-gate AlGaN/GaN HEMTs using Low-damage Contactless Photo-Electrochemical Etching Masachika Toguchi, Kazuki Miwa, Fumimasa Horikiri, Noboru Fukuhara, Yoshinobu Narita, Osamu Ichikawa, Ryota Isono, Takeshi Tanaka, Taketomo Sato, |
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| PDF Download Page |  PDF download Page Link |
| Abstract(in Japanese) | (See Japanese page) |
| Abstract(in English) | |
| Keyword(in Japanese) | (See Japanese page) |
| Keyword(in English) | |
| Paper # | ED2021-34,CPM2021-68,LQE2021-46 |
| Date of Issue | 2021-11-18 (ED, CPM, LQE) |
| Conference Information | |
| Committee | ED / CPM / LQE |
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| Conference Date | 2021/11/25(2days) |
| Place (in Japanese) | (See Japanese page) |
| Place (in English) | Online |
| Topics (in Japanese) | (See Japanese page) |
| Topics (in English) | |
| Chair | Hiroki Fujishiro(Tokyo Univ. of Science) / Yuichi Nakamura(Toyohashi Univ. of Tech.) / Toshitada Umezawa(NICT) |
| Vice Chair | Seiya Sakai(Hokkaido Univ.) / Hideki Nakazawa(Hirosaki Univ.) / Junichi Takahara(Osaka Univ.) |
| Secretary | Seiya Sakai(Fjitsu Lab.) / Hideki Nakazawa(NTT) / Junichi Takahara(Ehime Univ.) |
| Assistant | Ryota Isonoi(SCIOCS) / Yoshitugu Yamamoto(Mitsubishi Electric) / Yasuo Kimura(Tokyo Univ. of Tech.) / Fumihiko Hirose(Yamagata Univ.) / Noriko Bamba(Shinshu Univ.) / Shinsuke Tanaka(Fujitsu) / Nobuhiko Nishiyama(Tokyo Inst. of Tech.) |
| Paper Information | |
| Registration To | Technical Committee on Electron Devices / Technical Committee on Component Parts and Materials / Technical Committee on Lasers and Quantum Electronics |
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| Language | JPN |
| Title (in Japanese) | (See Japanese page) |
| Sub Title (in Japanese) | (See Japanese page) |
| Title (in English) | Fabrication of Recessed-gate AlGaN/GaN HEMTs using Low-damage Contactless Photo-Electrochemical Etching |
| Sub Title (in English) | |
| Keyword(1) | |
| Keyword(2) | |
| Keyword(3) | |
| Keyword(4) | |
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| 1st Author's Name | Masachika Toguchi |
| 1st Author's Affiliation | Hokkaido University(Hokkaido Univ.) |
| 2nd Author's Name | Kazuki Miwa |
| 2nd Author's Affiliation | Hokkaido University(Hokkaido Univ.) |
| 3rd Author's Name | Fumimasa Horikiri |
| 3rd Author's Affiliation | SCIOCS Co., Ltd.(SCIOCS) |
| 4th Author's Name | Noboru Fukuhara |
| 4th Author's Affiliation | SCIOCS Co., Ltd.(SCIOCS) |
| 5th Author's Name | Yoshinobu Narita |
| 5th Author's Affiliation | SCIOCS Co., Ltd.(SCIOCS) |
| 6th Author's Name | Osamu Ichikawa |
| 6th Author's Affiliation | SCIOCS Co., Ltd.(SCIOCS) |
| 7th Author's Name | Ryota Isono |
| 7th Author's Affiliation | SCIOCS Co., Ltd.(SCIOCS) |
| 8th Author's Name | Takeshi Tanaka |
| 8th Author's Affiliation | SCIOCS Co., Ltd.(SCIOCS) |
| 9th Author's Name | Taketomo Sato |
| 9th Author's Affiliation | Hokkaido University(Hokkaido Univ.) |
| Date | 2021-11-26 |
| Paper # | ED2021-34,CPM2021-68,LQE2021-46 |
| Volume (vol) | vol.121 |
| Number (no) | ED-259,CPM-260,LQE-261 |
| Page | pp.pp.87-90(ED), pp.87-90(CPM), pp.87-90(LQE), |
| #Pages | 4 |
| Date of Issue | 2021-11-18 (ED, CPM, LQE) |