Presentation 2021-11-25
Photoluminescence study of high-purity GaN homoepitaxial layers grown by hydride vapor phase epitaxy
Hiroto Imashiro, Ryo Yamahida, Hironao Kanamori, Ryuichi Watanabe, Takeshi Kimura, Taichiro Konno, Hajime Fujikura, Atsushi A. Yamaguchi,
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Abstract(in Japanese) (See Japanese page)
Abstract(in English) The fundamental material properties of GaN and its related materials have not been fully understood. One of the reasons for this is that perfect-quality crystal has not been fabricated. Recently, high-purity GaN homoepitaxial layers have successfully been grown by hydride vapor phase epitaxy (HVPE). In this study, we have performed photoluminescence (PL) studies in the temperature range of 2 K ~ 300 K to clarify the optical properties and carrier dynamics of the pure GaN crystal material itself. As a result, PL spectra with very sharp peaks have been obtained at 2 K. It is observed that the intensity ratio of free exciton (FX) emission to donor-bound exciton (DBE) emission in the low-temperature region, simply correlates with the donor concentration. On the other hand, in the high temperature region, the intensity ratio of the longitudinal optical (LO) phonon replica to the zero-phonon line correlates with concentration of impurity other than donor atom.
Keyword(in Japanese) (See Japanese page)
Keyword(in English) GaN / PL / exciton / LO phonon replica
Paper # ED2021-22,CPM2021-56,LQE2021-34
Date of Issue 2021-11-18 (ED, CPM, LQE)

Conference Information
Committee ED / CPM / LQE
Conference Date 2021/11/25(2days)
Place (in Japanese) (See Japanese page)
Place (in English) Online
Topics (in Japanese) (See Japanese page)
Topics (in English)
Chair Hiroki Fujishiro(Tokyo Univ. of Science) / Yuichi Nakamura(Toyohashi Univ. of Tech.) / Toshitada Umezawa(NICT)
Vice Chair Seiya Sakai(Hokkaido Univ.) / Hideki Nakazawa(Hirosaki Univ.) / Junichi Takahara(Osaka Univ.)
Secretary Seiya Sakai(Fjitsu Lab.) / Hideki Nakazawa(NTT) / Junichi Takahara(Ehime Univ.)
Assistant Ryota Isonoi(SCIOCS) / Yoshitugu Yamamoto(Mitsubishi Electric) / Yasuo Kimura(Tokyo Univ. of Tech.) / Fumihiko Hirose(Yamagata Univ.) / Noriko Bamba(Shinshu Univ.) / Shinsuke Tanaka(Fujitsu) / Nobuhiko Nishiyama(Tokyo Inst. of Tech.)

Paper Information
Registration To Technical Committee on Electron Devices / Technical Committee on Component Parts and Materials / Technical Committee on Lasers and Quantum Electronics
Language JPN
Title (in Japanese) (See Japanese page)
Sub Title (in Japanese) (See Japanese page)
Title (in English) Photoluminescence study of high-purity GaN homoepitaxial layers grown by hydride vapor phase epitaxy
Sub Title (in English)
Keyword(1) GaN
Keyword(2) PL
Keyword(3) exciton
Keyword(4) LO phonon replica
1st Author's Name Hiroto Imashiro
1st Author's Affiliation Kanazawa Institute of Technology(KIT)
2nd Author's Name Ryo Yamahida
2nd Author's Affiliation Kanazawa Institute of Technology(KIT)
3rd Author's Name Hironao Kanamori
3rd Author's Affiliation Kanazawa Institute of Technology(KIT)
4th Author's Name Ryuichi Watanabe
4th Author's Affiliation Kanazawa Institute of Technology(KIT)
5th Author's Name Takeshi Kimura
5th Author's Affiliation SCIOCS COMPANY LIMITED(SCIOCS)
6th Author's Name Taichiro Konno
6th Author's Affiliation SCIOCS COMPANY LIMITED(SCIOCS)
7th Author's Name Hajime Fujikura
7th Author's Affiliation SCIOCS COMPANY LIMITED(SCIOCS)
8th Author's Name Atsushi A. Yamaguchi
8th Author's Affiliation Kanazawa Institute of Technology(KIT)
Date 2021-11-25
Paper # ED2021-22,CPM2021-56,LQE2021-34
Volume (vol) vol.121
Number (no) ED-259,CPM-260,LQE-261
Page pp.pp.37-40(ED), pp.37-40(CPM), pp.37-40(LQE),
#Pages 4
Date of Issue 2021-11-18 (ED, CPM, LQE)