| Presentation | 2021-12-02 Mask Optimization Method Using Simulated Quantum Annealing Yukihide Kohira, Haruki Nakayama, Naoki Nonaka, Tomomi Matsui, Atsushi Takahashi, Chikaaki Kodama, |
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| PDF Download Page |  PDF download Page Link |
| Abstract(in Japanese) | (See Japanese page) |
| Abstract(in English) | To realize continuously scaling down of technology node, progressing manufacturing process by optical lithography is required. In resolution enhancement techniques in the optical lithography, Optical Proximity Correction (OPC), which improves shape fidelity of formed patterns on wafers to designed target patterns by mask optimization, is essential. It is known that the mask optimization can be formulated as 0-1 Quadratic Programming problem (0-1 QP). Recently, Quantum Annealing, which solves 0-1 QP in a short computation time, has attracted attention. In this paper, we examine a method using Simulated Quantum Annealing (SQA) for the mask optimization problem to obtain a mask with high fidelity to target patterns as well as high tolerance to process variation. In experiments, we evaluate the method using SQA and existing methods in fidelity to target patterns, tolerance to process variation, and execution time. |
| Keyword(in Japanese) | (See Japanese page) |
| Keyword(in English) | optical lithography / mask optimization / Optical Proximity Correction (OPC) / Simulated Quantum Annealing |
| Paper # | VLD2021-45,ICD2021-55,DC2021-51,RECONF2021-53 |
| Date of Issue | 2021-11-24 (VLD, ICD, DC, RECONF) |
| Conference Information | |
| Committee | VLD / DC / RECONF / ICD / IPSJ-SLDM |
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| Conference Date | 2021/12/1(2days) |
| Place (in Japanese) | (See Japanese page) |
| Place (in English) | Online |
| Topics (in Japanese) | (See Japanese page) |
| Topics (in English) | Design Gaia 2021 -New Field of VLSI Design- |
| Chair | Kazutoshi Kobayashi(Kyoto Inst. of Tech.) / Hiroshi Takahashi(Ehime Univ.) / Kentaro Sano(RIKEN) / Masafumi Takahashi(Kioxia) / Yuichi Nakamura(NEC) |
| Vice Chair | Minako Ikeda(NTT) / Tatsuhiro Tsuchiya(Osaka Univ.) / Yoshiki Yamaguchi(Tsukuba Univ.) / Tomonori Izumi(Ritsumeikan Univ.) / Makoto Ikeda(Univ. of Tokyo) |
| Secretary | Minako Ikeda(Osaka Univ.) / Tatsuhiro Tsuchiya(NEC) / Yoshiki Yamaguchi(Nihon Univ.) / Tomonori Izumi(Chiba Univ.) / Makoto Ikeda(NEC) / (Tokyo Inst. of Tech.) |
| Assistant | / / Yukitaka Takemura(INTEL) / Yasunori Osana(Ryukyu Univ.) / Kosuke Miyaji(Shinshu Univ.) / Yoshiaki Yoshihara(キオクシア) / Takeshi Kuboki(Kyushu Univ.) |
| Paper Information | |
| Registration To | Technical Committee on VLSI Design Technologies / Technical Committee on Dependable Computing / Technical Committee on Reconfigurable Systems / Technical Committee on Integrated Circuits and Devices / Special Interest Group on System and LSI Design Methodology |
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| Language | JPN |
| Title (in Japanese) | (See Japanese page) |
| Sub Title (in Japanese) | (See Japanese page) |
| Title (in English) | Mask Optimization Method Using Simulated Quantum Annealing |
| Sub Title (in English) | |
| Keyword(1) | optical lithography |
| Keyword(2) | mask optimization |
| Keyword(3) | Optical Proximity Correction (OPC) |
| Keyword(4) | Simulated Quantum Annealing |
| 1st Author's Name | Yukihide Kohira |
| 1st Author's Affiliation | The University of Aizu(Univ. of Aizu) |
| 2nd Author's Name | Haruki Nakayama |
| 2nd Author's Affiliation | The University of Aizu(Univ. of Aizu) |
| 3rd Author's Name | Naoki Nonaka |
| 3rd Author's Affiliation | The University of Aizu(Univ. of Aizu) |
| 4th Author's Name | Tomomi Matsui |
| 4th Author's Affiliation | Tokyo Institute of Technology(Tokyo Tech) |
| 5th Author's Name | Atsushi Takahashi |
| 5th Author's Affiliation | Tokyo Institute of Technology(Tokyo Tech) |
| 6th Author's Name | Chikaaki Kodama |
| 6th Author's Affiliation | KIOXIA Corporation(KIOXIA Corporation) |
| Date | 2021-12-02 |
| Paper # | VLD2021-45,ICD2021-55,DC2021-51,RECONF2021-53 |
| Volume (vol) | vol.121 |
| Number (no) | VLD-277,ICD-278,DC-279,RECONF-280 |
| Page | pp.pp.162-167(VLD), pp.162-167(ICD), pp.162-167(DC), pp.162-167(RECONF), |
| #Pages | 6 |
| Date of Issue | 2021-11-24 (VLD, ICD, DC, RECONF) |