Presentation | 2021-06-22 [Invited Lecture] FET characteristics with 2D channel Hitoshi Wakabayashi, |
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PDF Download Page | PDF download Page Link |
Abstract(in Japanese) | (See Japanese page) |
Abstract(in English) | |
Keyword(in Japanese) | (See Japanese page) |
Keyword(in English) | |
Paper # | SDM2021-24 |
Date of Issue | 2021-06-15 (SDM) |
Conference Information | |
Committee | SDM |
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Conference Date | 2021/6/22(1days) |
Place (in Japanese) | (See Japanese page) |
Place (in English) | Online Virtual Meeting |
Topics (in Japanese) | (See Japanese page) |
Topics (in English) | Material Science and Process Technology for MOS Devices and Memories |
Chair | Hiroshige Hirano(TowerPartners Semiconductor) |
Vice Chair | Shunichiro Ohmi(Tokyo Inst. of Tech.) |
Secretary | Shunichiro Ohmi(AIST) |
Assistant | Taiji Noda(Panasonic) / Tomoyuki Suwa(Tohoku Univ.) |
Paper Information | |
Registration To | Technical Committee on Silicon Device and Materials |
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Language | JPN |
Title (in Japanese) | (See Japanese page) |
Sub Title (in Japanese) | (See Japanese page) |
Title (in English) | [Invited Lecture] FET characteristics with 2D channel |
Sub Title (in English) | |
Keyword(1) | |
1st Author's Name | Hitoshi Wakabayashi |
1st Author's Affiliation | Tokyo Institute of Technology(Tokyo Tech) |
Date | 2021-06-22 |
Paper # | SDM2021-24 |
Volume (vol) | vol.121 |
Number (no) | SDM-71 |
Page | pp.pp.13-15(SDM), |
#Pages | 3 |
Date of Issue | 2021-06-15 (SDM) |