Presentation | 2021-02-05 [Invited Talk] Ru Area Selective Metal Capping and Wafer Surface Condition Control for sub-30nm Pitch Cu Damascene Interconnect Hirokazu Aizawa, Kaoru Maekawa, Kai-Hung Yu, Gyana Pattanaik, Gert Leusink, |
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PDF Download Page | PDF download Page Link |
Abstract(in Japanese) | (See Japanese page) |
Abstract(in English) | |
Keyword(in Japanese) | (See Japanese page) |
Keyword(in English) | |
Paper # | SDM2020-55 |
Date of Issue | 2021-01-29 (SDM) |
Conference Information | |
Committee | SDM |
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Conference Date | 2021/2/5(1days) |
Place (in Japanese) | (See Japanese page) |
Place (in English) | Online |
Topics (in Japanese) | (See Japanese page) |
Topics (in English) | |
Chair | Hiroshige Hirano(TowerPartners Semiconductor) |
Vice Chair | Shunichiro Ohmi(Tokyo Inst. of Tech.) |
Secretary | Shunichiro Ohmi(AIST) |
Assistant | Taiji Noda(Panasonic) / Tomoyuki Suwa(Tohoku Univ.) |
Paper Information | |
Registration To | Technical Committee on Silicon Device and Materials |
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Language | ENG-JTITLE |
Title (in Japanese) | (See Japanese page) |
Sub Title (in Japanese) | (See Japanese page) |
Title (in English) | [Invited Talk] Ru Area Selective Metal Capping and Wafer Surface Condition Control for sub-30nm Pitch Cu Damascene Interconnect |
Sub Title (in English) | |
Keyword(1) | |
1st Author's Name | Hirokazu Aizawa |
1st Author's Affiliation | TEL Technology Center, America, LLC(TTCA) |
2nd Author's Name | Kaoru Maekawa |
2nd Author's Affiliation | TEL Technology Center, America, LLC(TTCA) |
3rd Author's Name | Kai-Hung Yu |
3rd Author's Affiliation | TEL Technology Center, America, LLC(TTCA) |
4th Author's Name | Gyana Pattanaik |
4th Author's Affiliation | TEL Technology Center, America, LLC(TTCA) |
5th Author's Name | Gert Leusink |
5th Author's Affiliation | TEL Technology Center, America, LLC(TTCA) |
Date | 2021-02-05 |
Paper # | SDM2020-55 |
Volume (vol) | vol.120 |
Number (no) | SDM-359 |
Page | pp.pp.1-6(SDM), |
#Pages | 6 |
Date of Issue | 2021-01-29 (SDM) |