| Presentation | 2020-11-20 Evaluation of (Er,Y)2SiO5 crystal prepared by Programmable Radical Assisted Sputtering Tomoki Kasumi, Yasuhito Tanaka, Hideo Isshiki, |
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| PDF Download Page |  PDF download Page Link |
| Abstract(in Japanese) | (See Japanese page) |
| Abstract(in English) | Research on integrated optical devices is underway toward the realization of optical integrated circuits. Among them, Si Photonics, which can be integrated on a Si substrate and can form an optical integrated circuit by the existing CMOS process technology, is attracting attention. There is a (Er,Y)2SiO5 crystal as an optical amplification medium used for Si Photonics, but until now there has been no suitable fabrication method for device fabrication. In this research, based on the RAS (Radical Assisted Sputtering) method, we have developed a fabrication method that is multidimensional and has good controllability of composition ratio and is suitable for device development. It has excellent luminescence characteristics at room temperature and is highly oriented (Er,Y)2SiO5 crystals were prepared. |
| Keyword(in Japanese) | (See Japanese page) |
| Keyword(in English) | Si Photonics / RAS / (Er,Y)2SiO5 |
| Paper # | OPE2020-69,LQE2020-49 |
| Date of Issue | 2020-11-13 (OPE, LQE) |
| Conference Information | |
| Committee | OPE / LQE |
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| Conference Date | 2020/11/20(1days) |
| Place (in Japanese) | (See Japanese page) |
| Place (in English) | Online |
| Topics (in Japanese) | (See Japanese page) |
| Topics (in English) | |
| Chair | Goji Nakagawa(Fujitsu) / Hiroshi Yasaka(Tohoku Univ.) |
| Vice Chair | Takaaki Ishigure(Keio Univ.) / Toshitada Umezawa(NICT) |
| Secretary | Takaaki Ishigure(Gunma Univ.) / Toshitada Umezawa(Fujikura) |
| Assistant | Junichi Fujikata(PETRA) / Toshio Watanabe(Kagoshima Univ.) / Kazuue Fujita(Hamamatsu) / Nobuhiko Nishiyama(Tokyo Inst. of Tech.) |
| Paper Information | |
| Registration To | Technical Committee on OptoElectronics / Technical Committee on Lasers and Quantum Electronics |
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| Language | JPN |
| Title (in Japanese) | (See Japanese page) |
| Sub Title (in Japanese) | (See Japanese page) |
| Title (in English) | Evaluation of (Er,Y)2SiO5 crystal prepared by Programmable Radical Assisted Sputtering |
| Sub Title (in English) | |
| Keyword(1) | Si Photonics |
| Keyword(2) | RAS |
| Keyword(3) | (Er,Y)2SiO5 |
| 1st Author's Name | Tomoki Kasumi |
| 1st Author's Affiliation | The University of Electro-Communications(UEC) |
| 2nd Author's Name | Yasuhito Tanaka |
| 2nd Author's Affiliation | SHINCRON Co./The University of Electro-Communications(SHINCRON/UEC) |
| 3rd Author's Name | Hideo Isshiki |
| 3rd Author's Affiliation | The University of Electro-Communications(UEC) |
| Date | 2020-11-20 |
| Paper # | OPE2020-69,LQE2020-49 |
| Volume (vol) | vol.120 |
| Number (no) | OPE-243,LQE-244 |
| Page | pp.pp.122-124(OPE), pp.122-124(LQE), |
| #Pages | 3 |
| Date of Issue | 2020-11-13 (OPE, LQE) |