| Presentation | 2020-11-20 [Invited Talk] Insights into etching properties of atomic layer etching process for dielectric films Nobuyuki Kuboi, |
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| PDF Download Page |  PDF download Page Link |
| Abstract(in Japanese) | (See Japanese page) |
| Abstract(in English) | |
| Keyword(in Japanese) | (See Japanese page) |
| Keyword(in English) | |
| Paper # | SDM2020-32 |
| Date of Issue | 2020-11-12 (SDM) |
| Conference Information | |
| Committee | SDM |
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| Conference Date | 2020/11/19(2days) |
| Place (in Japanese) | (See Japanese page) |
| Place (in English) | Virtual conference |
| Topics (in Japanese) | (See Japanese page) |
| Topics (in English) | Process, Device, Circuit simulation, etc. |
| Chair | Hiroshige Hirano(TowerPartners Semiconductor) |
| Vice Chair | Shunichiro Ohmi(Tokyo Inst. of Tech.) |
| Secretary | Shunichiro Ohmi(AIST) |
| Assistant | Taiji Noda(Panasonic) / Tomoyuki Suwa(Tohoku Univ.) |
| Paper Information | |
| Registration To | Technical Committee on Silicon Device and Materials |
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| Language | JPN |
| Title (in Japanese) | (See Japanese page) |
| Sub Title (in Japanese) | (See Japanese page) |
| Title (in English) | [Invited Talk] Insights into etching properties of atomic layer etching process for dielectric films |
| Sub Title (in English) | |
| Keyword(1) | |
| Keyword(2) | |
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| 1st Author's Name | Nobuyuki Kuboi |
| 1st Author's Affiliation | Sony Semiconductor Solutions Corporation(SSS) |
| Date | 2020-11-20 |
| Paper # | SDM2020-32 |
| Volume (vol) | vol.120 |
| Number (no) | SDM-239 |
| Page | pp.pp.47-51(SDM), |
| #Pages | 5 |
| Date of Issue | 2020-11-12 (SDM) |