Presentation 2020-05-28
[Invited Talk] Fabrication Process of InP-HEMT-based Sub-millimeter Wave ICs for Beyond 5G Application
Takuya Tsutsumi, Hiroki Sugiyama, Hiroshi Hamada, Hideyuki Nosaka, Hideaki Matsuzaki,
PDF Download Page PDF download Page Link
Abstract(in Japanese) (See Japanese page)
Abstract(in English) The 300-GHz sub-millimeter-wave band is one of the candidate frequency for “Beyond 5G” networks to meet rapidly increasing traffic demands. InP-based Sub-millimeter-wave monolithic ICs (SMMICs) have attracted much attention for applying Beyond 5G because InP-based high electron mobility transistors (InP-HEMTs) feature superior RF characteristics. This paper briefly reviews fundamental physical demands and reports InP-HEMTs and wafer-level backside process technology. We also show a world-record-class 120-Gb/s wireless transmission with the distance of 9.8 m by using InP-HEMT-SMMIC modules with 300-GHz band.
Keyword(in Japanese) (See Japanese page)
Keyword(in English) Beyond 5G / Sub-millimeter-wave monolithic ICs / Indium phosphide / High electron mobility transistors / Wafer-level backside process / backside lines
Paper # MWP2020-1
Date of Issue 2020-05-21 (MWP)

Conference Information
Committee MWP
Conference Date 2020/5/28(1days)
Place (in Japanese) (See Japanese page)
Place (in English) Kikai-Shinko-Kaikan Bldg.
Topics (in Japanese) (See Japanese page)
Topics (in English)
Chair Naoto Yoshimoto(Chitose Inst. of Science and Tech.)
Vice Chair Akihiko Hirata(Chiba Inst. of Tech.)
Secretary Akihiko Hirata(Yazaki)
Assistant Kensuke Ikeda(CRIEPI) / Li Yi(Osaka Univ.) / Takashi Yamada(NTT)

Paper Information
Registration To Technical Committee on Microwave and Millimeter-wave Photonics
Language JPN
Title (in Japanese) (See Japanese page)
Sub Title (in Japanese) (See Japanese page)
Title (in English) [Invited Talk] Fabrication Process of InP-HEMT-based Sub-millimeter Wave ICs for Beyond 5G Application
Sub Title (in English)
Keyword(1) Beyond 5G
Keyword(2) Sub-millimeter-wave monolithic ICs
Keyword(3) Indium phosphide
Keyword(4) High electron mobility transistors
Keyword(5) Wafer-level backside process
Keyword(6) backside lines
1st Author's Name Takuya Tsutsumi
1st Author's Affiliation NTT Corporation(NTT)
2nd Author's Name Hiroki Sugiyama
2nd Author's Affiliation NTT Corporation(NTT)
3rd Author's Name Hiroshi Hamada
3rd Author's Affiliation NTT Corporation(NTT)
4th Author's Name Hideyuki Nosaka
4th Author's Affiliation NTT Corporation(NTT)
5th Author's Name Hideaki Matsuzaki
5th Author's Affiliation NTT Corporation(NTT)
Date 2020-05-28
Paper # MWP2020-1
Volume (vol) vol.120
Number (no) MWP-44
Page pp.pp.1-6(MWP),
#Pages 6
Date of Issue 2020-05-21 (MWP)