| Presentation | 2020-03-04 Pixel-based Mask Optimization with Lagrangian Relaxation and Boundary Flipping Rina Azuma, Yukihide Kohira, Tomomi Matsui, Atsushi Takahashi, Chikaaki Kodama, |
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| PDF Download Page |  PDF download Page Link |
| Abstract(in Japanese) | (See Japanese page) |
| Abstract(in English) | Due to miniaturization of process technology, progressing manufacturing process by optical lithography is required. In resolution enhancement techniques in the optical lithography, Optical Proximity Correction, which improves shape fidelity of formed patterns on wafers against designed target patterns by mask optimization, is essential to progress the optical lithography. In this paper, optimal parameters of Subgradient method are explored by computational experiments for an existing method using Lagrangian relaxation method and Subgradient method. Moreover, boundary flipping method is proposed and applied to the mask obtained by Lagrangian relaxation method to improve image contour fidelity. The proposed method is evaluated by comparing with existing methods in computational experiments. |
| Keyword(in Japanese) | (See Japanese page) |
| Keyword(in English) | lithography / lithography simulation / optical proximity correction (OPC) / design for manufacturability (DFM) |
| Paper # | VLD2019-105,HWS2019-78 |
| Date of Issue | 2020-02-26 (VLD, HWS) |
| Conference Information | |
| Committee | HWS / VLD |
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| Conference Date | 2020/3/4(4days) |
| Place (in Japanese) | (See Japanese page) |
| Place (in English) | Okinawa Ken Seinen Kaikan |
| Topics (in Japanese) | (See Japanese page) |
| Topics (in English) | Design Technology for System-on-Silicon, Hardware Security, etc. |
| Chair | Shinichi Kawamura(Toshiba) / Nozomu Togawa(Waseda Univ.) |
| Vice Chair | Makoto Ikeda(Univ. of Tokyo) / Yasuhisa Shimazaki(Renesas Electronics) / Daisuke Fukuda(Fujitsu Labs.) |
| Secretary | Makoto Ikeda(SECOM) / Yasuhisa Shimazaki(Kyushu Univ.) / Daisuke Fukuda(Univ. of Aizu) |
| Assistant | / Kazuki Ikeda(Hitachi) |
| Paper Information | |
| Registration To | Technical Committee on Hardware Security / Technical Committee on VLSI Design Technologies |
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| Language | JPN |
| Title (in Japanese) | (See Japanese page) |
| Sub Title (in Japanese) | (See Japanese page) |
| Title (in English) | Pixel-based Mask Optimization with Lagrangian Relaxation and Boundary Flipping |
| Sub Title (in English) | |
| Keyword(1) | lithography |
| Keyword(2) | lithography simulation |
| Keyword(3) | optical proximity correction (OPC) |
| Keyword(4) | design for manufacturability (DFM) |
| 1st Author's Name | Rina Azuma |
| 1st Author's Affiliation | the University of Aizu(Univ. of Aizu) |
| 2nd Author's Name | Yukihide Kohira |
| 2nd Author's Affiliation | the University of Aizu(Univ. of Aizu) |
| 3rd Author's Name | Tomomi Matsui |
| 3rd Author's Affiliation | Tokyo Institute of Technology(Tokyo Tech) |
| 4th Author's Name | Atsushi Takahashi |
| 4th Author's Affiliation | Tokyo Institute of Technology(Tokyo Tech) |
| 5th Author's Name | Chikaaki Kodama |
| 5th Author's Affiliation | KIOXIA Corporation(KIOXIA) |
| Date | 2020-03-04 |
| Paper # | VLD2019-105,HWS2019-78 |
| Volume (vol) | vol.119 |
| Number (no) | VLD-443,HWS-444 |
| Page | pp.pp.65-70(VLD), pp.65-70(HWS), |
| #Pages | 6 |
| Date of Issue | 2020-02-26 (VLD, HWS) |