Presentation | 2020-03-04 Machine Learning Based Lithography Hotspot Detection Method and Evaluation Hidekazu Takahashi, Shimpei Sato, Atsushi Takahashi, |
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PDF Download Page | PDF download Page Link |
Abstract(in Japanese) | (See Japanese page) |
Abstract(in English) | As VLSI device feature sizes are getting smaller and smaller, layout designhas become more important to keep the yield. Machine learning based method is one of the candidates to detect layoutpatterns which cause yield loss, called hotspots. ICCAD2012 contest dataset is widely used to evaluate machine learning basedmethods, however, training-set and test-set contain the identical data. In order to evaluate these methods appropriately, it is necessary to evaluatethe ability of them by using the data that are not contained in training-set. Original ICCAD2012 dataset does not fit to this purpose. In practice, even minor nm-level variations of a non-hotspot could become a hotspot. ICCAD2012 dataset include no such data. In this paper, we re-evaluate the existing machine learning based methods using the new dataset developed recently. |
Keyword(in Japanese) | (See Japanese page) |
Keyword(in English) | Hotspot / Dataset / Machine Learning |
Paper # | VLD2019-106,HWS2019-79 |
Date of Issue | 2020-02-26 (VLD, HWS) |
Conference Information | |
Committee | HWS / VLD |
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Conference Date | 2020/3/4(4days) |
Place (in Japanese) | (See Japanese page) |
Place (in English) | Okinawa Ken Seinen Kaikan |
Topics (in Japanese) | (See Japanese page) |
Topics (in English) | Design Technology for System-on-Silicon, Hardware Security, etc. |
Chair | Shinichi Kawamura(Toshiba) / Nozomu Togawa(Waseda Univ.) |
Vice Chair | Makoto Ikeda(Univ. of Tokyo) / Yasuhisa Shimazaki(Renesas Electronics) / Daisuke Fukuda(Fujitsu Labs.) |
Secretary | Makoto Ikeda(SECOM) / Yasuhisa Shimazaki(Kyushu Univ.) / Daisuke Fukuda(Univ. of Aizu) |
Assistant | / Kazuki Ikeda(Hitachi) |
Paper Information | |
Registration To | Technical Committee on Hardware Security / Technical Committee on VLSI Design Technologies |
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Language | JPN |
Title (in Japanese) | (See Japanese page) |
Sub Title (in Japanese) | (See Japanese page) |
Title (in English) | Machine Learning Based Lithography Hotspot Detection Method and Evaluation |
Sub Title (in English) | |
Keyword(1) | Hotspot |
Keyword(2) | Dataset |
Keyword(3) | Machine Learning |
1st Author's Name | Hidekazu Takahashi |
1st Author's Affiliation | Tokyo Institute of Technology(Tokyo Tech) |
2nd Author's Name | Shimpei Sato |
2nd Author's Affiliation | Tokyo Institute of Technology(Tokyo Tech) |
3rd Author's Name | Atsushi Takahashi |
3rd Author's Affiliation | Tokyo Institute of Technology(Tokyo Tech) |
Date | 2020-03-04 |
Paper # | VLD2019-106,HWS2019-79 |
Volume (vol) | vol.119 |
Number (no) | VLD-443,HWS-444 |
Page | pp.pp.71-76(VLD), pp.71-76(HWS), |
#Pages | 6 |
Date of Issue | 2020-02-26 (VLD, HWS) |