| Presentation | 2020-03-04 Additional Training Data Generation for Lithography Hotspot Detection by Modifying Existing Training Data Gaku Kataoka, Masato Inagi, Shinobu Nagayama, Shin'ichi Wakabayashi, |
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| PDF Download Page |  PDF download Page Link |
| Abstract(in Japanese) | (See Japanese page) |
| Abstract(in English) | In lithography, a circuit pattern that is highly likely to cause an undesired open- and short-circuit after transfer is called a hotspot.Since hotspots cause a lower yield, they need to be detected and removed at the design stage.In recent years, several methods based on machine learning have been proposed as a fast hotspot candidates detection methods, but there have been problems in the number of data of existing circuit pattern data set and the validities of the original labels.In this study, the validities of the labels given in the existing circuit pattern data set is analyzed using the optical simulation, and additionally generate the training data by modifying the data set. |
| Keyword(in Japanese) | (See Japanese page) |
| Keyword(in English) | lithography / hotspot / data set / optical simulation |
| Paper # | VLD2019-107,HWS2019-80 |
| Date of Issue | 2020-02-26 (VLD, HWS) |
| Conference Information | |
| Committee | HWS / VLD |
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| Conference Date | 2020/3/4(4days) |
| Place (in Japanese) | (See Japanese page) |
| Place (in English) | Okinawa Ken Seinen Kaikan |
| Topics (in Japanese) | (See Japanese page) |
| Topics (in English) | Design Technology for System-on-Silicon, Hardware Security, etc. |
| Chair | Shinichi Kawamura(Toshiba) / Nozomu Togawa(Waseda Univ.) |
| Vice Chair | Makoto Ikeda(Univ. of Tokyo) / Yasuhisa Shimazaki(Renesas Electronics) / Daisuke Fukuda(Fujitsu Labs.) |
| Secretary | Makoto Ikeda(SECOM) / Yasuhisa Shimazaki(Kyushu Univ.) / Daisuke Fukuda(Univ. of Aizu) |
| Assistant | / Kazuki Ikeda(Hitachi) |
| Paper Information | |
| Registration To | Technical Committee on Hardware Security / Technical Committee on VLSI Design Technologies |
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| Language | JPN |
| Title (in Japanese) | (See Japanese page) |
| Sub Title (in Japanese) | (See Japanese page) |
| Title (in English) | Additional Training Data Generation for Lithography Hotspot Detection by Modifying Existing Training Data |
| Sub Title (in English) | |
| Keyword(1) | lithography |
| Keyword(2) | hotspot |
| Keyword(3) | data set |
| Keyword(4) | optical simulation |
| 1st Author's Name | Gaku Kataoka |
| 1st Author's Affiliation | Hiroshima City University(Hiroshima City Univ.) |
| 2nd Author's Name | Masato Inagi |
| 2nd Author's Affiliation | Hiroshima City University(Hiroshima City Univ.) |
| 3rd Author's Name | Shinobu Nagayama |
| 3rd Author's Affiliation | Hiroshima City University(Hiroshima City Univ.) |
| 4th Author's Name | Shin'ichi Wakabayashi |
| 4th Author's Affiliation | Hiroshima City University(Hiroshima City Univ.) |
| Date | 2020-03-04 |
| Paper # | VLD2019-107,HWS2019-80 |
| Volume (vol) | vol.119 |
| Number (no) | VLD-443,HWS-444 |
| Page | pp.pp.77-82(VLD), pp.77-82(HWS), |
| #Pages | 6 |
| Date of Issue | 2020-02-26 (VLD, HWS) |