Presentation | 2019-12-23 GaInSb n-Channel HEMTs Using Strained-Al0.40In0.60Sb/Al0.25In0.75Sb Stepped Buffer Koki Osawa, Takuya Iwaki, Yuki Endoh, Mizuho Hiraoka, Naoyuki Kishimoto, Takuya Hayashi, Issei Watanabe, Yoshimi Yamashita, Shinsuke Hara, Takahiro Gotow, Akifumi Kasamatsu, Akira Endoh, Hiroki Fujishiro, |
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PDF Download Page | PDF download Page Link |
Abstract(in Japanese) | (See Japanese page) |
Abstract(in English) | We succeeded in fabricating GaInSb n-channel HEMTs for the first time in the world and measured their characteristics. We used strained-Al0.40In0.60Sb/Al0.25In0.75Sb stepped buffer and AlInSb barrier layer with high Al content. As a result, the sheet electron density NS increases while keeping relatively high electron mobility ? compared with the Al0.25In0.75Sb/InSb HEMT which we fabricated previously. We obtained a cutoff frequency fT of 214 GHz for the 40-nm-gate HEMT and a maximum oscillation frequency fmax of 179 GHz for the 200-nm-gate HEMT. Furthermore, this novel GaInSb HEMT structure contributes to the reduction of gate leakage current as well as the increase of NS. |
Keyword(in Japanese) | (See Japanese page) |
Keyword(in English) | High Electron Mobility Transistor / HEMT / GaInSb / InSb / Quantum well / Cutoff frequency / Maximum oscillation frequency |
Paper # | ED2019-83 |
Date of Issue | 2019-12-16 (ED) |
Conference Information | |
Committee | ED |
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Conference Date | 2019/12/23(2days) |
Place (in Japanese) | (See Japanese page) |
Place (in English) | |
Topics (in Japanese) | (See Japanese page) |
Topics (in English) | |
Chair | Michihiko Suhara(TMU) |
Vice Chair | Hiroki Fujishiro(Tokyo Univ. of Science) |
Secretary | Hiroki Fujishiro(Saga Univ.) |
Assistant | Junji Kotani(Fjitsu Lab.) / Takuya Tsutsumi(NTT) |
Paper Information | |
Registration To | Technical Committee on Electron Devices |
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Language | JPN |
Title (in Japanese) | (See Japanese page) |
Sub Title (in Japanese) | (See Japanese page) |
Title (in English) | GaInSb n-Channel HEMTs Using Strained-Al0.40In0.60Sb/Al0.25In0.75Sb Stepped Buffer |
Sub Title (in English) | |
Keyword(1) | High Electron Mobility Transistor |
Keyword(2) | HEMT |
Keyword(3) | GaInSb |
Keyword(4) | InSb |
Keyword(5) | Quantum well |
Keyword(6) | Cutoff frequency |
Keyword(7) | Maximum oscillation frequency |
1st Author's Name | Koki Osawa |
1st Author's Affiliation | Tokyo University of Science(TUS) |
2nd Author's Name | Takuya Iwaki |
2nd Author's Affiliation | Tokyo University of Science(TUS) |
3rd Author's Name | Yuki Endoh |
3rd Author's Affiliation | Tokyo University of Science(TUS) |
4th Author's Name | Mizuho Hiraoka |
4th Author's Affiliation | Tokyo University of Science(TUS) |
5th Author's Name | Naoyuki Kishimoto |
5th Author's Affiliation | Tokyo University of Science(TUS) |
6th Author's Name | Takuya Hayashi |
6th Author's Affiliation | Tokyo University of Science(TUS) |
7th Author's Name | Issei Watanabe |
7th Author's Affiliation | National Institute of Information and Communications Technology/Tokyo University of Science(NICT/TUS) |
8th Author's Name | Yoshimi Yamashita |
8th Author's Affiliation | National Institute of Information and Communications Technology(NICT) |
9th Author's Name | Shinsuke Hara |
9th Author's Affiliation | National Institute of Information and Communications Technology(NICT) |
10th Author's Name | Takahiro Gotow |
10th Author's Affiliation | National Institute of Information and Communications Technology(NICT) |
11th Author's Name | Akifumi Kasamatsu |
11th Author's Affiliation | National Institute of Information and Communications Technology(NICT) |
12th Author's Name | Akira Endoh |
12th Author's Affiliation | Tokyo University of Science(TUS) |
13th Author's Name | Hiroki Fujishiro |
13th Author's Affiliation | Tokyo University of Science(TUS) |
Date | 2019-12-23 |
Paper # | ED2019-83 |
Volume (vol) | vol.119 |
Number (no) | ED-353 |
Page | pp.pp.29-32(ED), |
#Pages | 4 |
Date of Issue | 2019-12-16 (ED) |