Presentation 2019-12-06
Observation of residual stress during film growth of magnetic thin films
Shigeki Nakagawa, Hisanori Hayashibara, Masanari Nakagomi, Yoshimasa Ogawa, Yota Takamura,
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Abstract(in Japanese) (See Japanese page)
Abstract(in English) Residual stress of films during the deposition process contains valuable information of growth mechanisms, such as formation of nano-structure, phase transition, interaction of nano-size grains, etc. We have developed in-situ observation system of internal stress σ using cantilever method to detect deviation of a substrate being deposited of films from the original position. Transitions from islands to continuous structure of Ti and Ru layers were clearly evaluated by observing maximum point of σ?t as a function of nominal thickness t. Surface energy of the materials for deposition of films are important factor to determine critical thickness for the transitions. Abrupt jump of σ?t appeared just after the island-continuous transition in FeCo films is originated from a phase transition from amorphous to crystalline phase. Observation of development of internal stress during the deposition of CoPtCr-SiO2 (CPC-SiO2), granular type films deposited on Ru underlayer in sub-nm thickness region to clarify formation mechanisms of the granular structure. CPC-SiO2 films were deposited at high Ar gas pressure on Ru underlayers which is prepared at various preparation conditions. The growth mechanism of CPC grains seems to be strongly affected by the crystalline orientation of Ru underlayer in the initial stage of the film growth.
Keyword(in Japanese) (See Japanese page)
Keyword(in English) Internal residual stress / In-situ observation / Ferromagnetic films / Granular films / Growth mechanism of films
Paper # MRIS2019-45
Date of Issue 2019-11-28 (MRIS)

Conference Information
Committee MRIS / ITE-MMS
Conference Date 2019/12/5(2days)
Place (in Japanese) (See Japanese page)
Place (in English) Ehime University
Topics (in Japanese) (See Japanese page)
Topics (in English) Signal Processing and Others
Chair Satoshi Matsunuma(Maxell) / Norihiko Ishii(NHK)
Vice Chair
Secretary (Toshiba) / (Kinki Univ.)
Assistant Ikuya Tagawa(Tohoku Inst. of Tech.) / Hiroko Arai(AIST)

Paper Information
Registration To Technical Committee on Magnetic Recording & Information Storage / Technical Group on Multi-media Storage
Language JPN
Title (in Japanese) (See Japanese page)
Sub Title (in Japanese) (See Japanese page)
Title (in English) Observation of residual stress during film growth of magnetic thin films
Sub Title (in English)
Keyword(1) Internal residual stress
Keyword(2) In-situ observation
Keyword(3) Ferromagnetic films
Keyword(4) Granular films
Keyword(5) Growth mechanism of films
1st Author's Name Shigeki Nakagawa
1st Author's Affiliation Tokyo Institute of Technology(Tokyo Tech)
2nd Author's Name Hisanori Hayashibara
2nd Author's Affiliation Tokyo Institute of Technology(Tokyo Tech)
3rd Author's Name Masanari Nakagomi
3rd Author's Affiliation Tokyo Institute of Technology(Tokyo Tech)
4th Author's Name Yoshimasa Ogawa
4th Author's Affiliation Tokyo Institute of Technology(Tokyo Tech)
5th Author's Name Yota Takamura
5th Author's Affiliation Tokyo Institute of Technology(Tokyo Tech)
Date 2019-12-06
Paper # MRIS2019-45
Volume (vol) vol.119
Number (no) MRIS-326
Page pp.pp.51-56(MRIS),
#Pages 6
Date of Issue 2019-11-28 (MRIS)