Presentation 2019-11-14
6-10GHz Cryogenic GaAs pHEMT LNA MMIC
Hayato Shimizu, Yudai Iwashita, Ryotaro Iwamoto, Tamio Kawaguchi, Kenjiro Nishikawa,
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Abstract(in Japanese) (See Japanese page)
Abstract(in English) This paper demonstrates a cryogenic broadband GaAs pHEMT LNA MMIC. The LNA was designed by using the modified GaAs pHEMT model, which includes the thermal characteristics of each device material. The MMIC was fabricated by using a commercial 0.25μm GaAs pHEMT process. The fabricated LNA MMIC achieved a noise figure of less than 0.3dB and an associated gain of over 15dB at 6-10 GHz. The corresponding return losses are better than 10dB. At 7GHz, the LNA realized a noise figure of 0.11dB (a noise temperature of7.7K) and an associated gain of 20dB. The power consumption is 25 mW. The MMIC size is 1.4mm x 1.0mm. These performances are the same level as those of LNAs at 10K-20K operation.
Keyword(in Japanese) (See Japanese page)
Keyword(in English)
Paper # MW2019-110
Date of Issue 2019-11-07 (MW)

Conference Information
Committee MW
Conference Date 2019/11/14(2days)
Place (in Japanese) (See Japanese page)
Place (in English) Minami Daido Villa. Tamokuteki Koryu Center
Topics (in Japanese) (See Japanese page)
Topics (in English) Microwave Technologies
Chair Yoshinori Kogami(Utsunomiya Univ.)
Vice Chair Tadashi Kawai(Univ. of Hyogo) / Kensuke Okubo(Okayama Prefectural Univ.) / Shintaro Shinjo(Mitsubishi Electric)
Secretary Tadashi Kawai(Utsunomiya Univ.) / Kensuke Okubo(Fujitsu Labs.) / Shintaro Shinjo
Assistant Satoshi Yoshida(Kagoshima Univ.) / Kyoya Takano(Tokyo Univ. of Science)

Paper Information
Registration To Technical Committee on Microwaves
Language JPN
Title (in Japanese) (See Japanese page)
Sub Title (in Japanese) (See Japanese page)
Title (in English) 6-10GHz Cryogenic GaAs pHEMT LNA MMIC
Sub Title (in English)
Keyword(1)
1st Author's Name Hayato Shimizu
1st Author's Affiliation Kagoshima University(Kagoshima Univ.)
2nd Author's Name Yudai Iwashita
2nd Author's Affiliation Kagoshima University(Kagoshima Univ.)
3rd Author's Name Ryotaro Iwamoto
3rd Author's Affiliation Kagoshima University(Kagoshima Univ.)
4th Author's Name Tamio Kawaguchi
4th Author's Affiliation Toshiba Corporation(Toshiba Corp.)
5th Author's Name Kenjiro Nishikawa
5th Author's Affiliation Kagoshima University(Kagoshima Univ.)
Date 2019-11-14
Paper # MW2019-110
Volume (vol) vol.119
Number (no) MW-292
Page pp.pp.59-63(MW),
#Pages 5
Date of Issue 2019-11-07 (MW)