| Presentation | 2019-11-15 Mask Optimization Considering Process Variation by Subgradient Method Yukihide Kohira, Rina Azuma, Tomomi Matsui, Atsushi Takahashi, Chikaaki Kodama, |
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| PDF Download Page |  PDF download Page Link |
| Abstract(in Japanese) | (See Japanese page) |
| Abstract(in English) | Due to miniaturization of process technology, progressing manufacturing process by optical lithography is required. In resolution enhancement techniques in the optical lithography, Optical Proximity Correction (OPC), which improves shape fidelity of formed patterns on wafers against designed target patterns by mask optimization, is essential to progress the optical lithography. In this paper, a mask optimization method by using Lagrangean relaxation method and subgradient method is proposed to generate masks with high tolerance against process variation. Experimental results show that the proposed method obtains masks with high shape fidelity and high tolerance against process variation in short computational times. |
| Keyword(in Japanese) | (See Japanese page) |
| Keyword(in English) | optical lithography / mask optimization / Optical Proximity Correction (OPC) / subgradient method / Lagrangean relaxation method |
| Paper # | VLD2019-53,DC2019-77 |
| Date of Issue | 2019-11-06 (VLD, DC) |
| Conference Information | |
| Committee | VLD / DC / CPSY / RECONF / ICD / IE / IPSJ-SLDM / IPSJ-EMB / IPSJ-ARC |
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| Conference Date | 2019/11/13(3days) |
| Place (in Japanese) | (See Japanese page) |
| Place (in English) | Ehime Prefecture Gender Equality Center |
| Topics (in Japanese) | (See Japanese page) |
| Topics (in English) | Design Gaia 2019 -New Field of VLSI Design- |
| Chair | Nozomu Togawa(Waseda Univ.) / Satoshi Fukumoto(Tokyo Metropolitan Univ.) / Hidetsugu Irie(Univ. of Tokyo) / Yuichiro Shibata(Nagasaki Univ.) / Makoto Nagata(Kobe Univ.) / Hideaki Kimata(NTT) / Yutaka Tamiya(Fujitsu Lab.) / / Hiroshi Inoue(Kyushu Univ.) |
| Vice Chair | Daisuke Fukuda(Fujitsu Labs.) / Hiroshi Takahashi(Ehime Univ.) / Michihiro Koibuchi(NII) / Kota Nakajima(Fujitsu Lab.) / Kentaro Sano(RIKEN) / Yoshiki Yamaguchi(Tsukuba Univ.) / Masafumi Takahashi(Toshiba-memory) / Kazuya Kodama(NII) / Keita Takahashi(Nagoya Univ.) |
| Secretary | Daisuke Fukuda(Univ. of Aizu) / Hiroshi Takahashi(Hitachi) / Michihiro Koibuchi(Nihon Univ.) / Kota Nakajima(Chiba Univ.) / Kentaro Sano(Nagoya Inst. of Tech.) / Yoshiki Yamaguchi(Hokkaido Univ.) / Masafumi Takahashi(Hiroshima City Univ.) / Kazuya Kodama(e-trees.Japan) / Keita Takahashi(Tohoku Univ.) / (Socionext) / (NTT) / (NHK) |
| Assistant | Kazuki Ikeda(Hitachi) / / Eiji Arima(Univ. of Tokyo) / Shugo Ogawa(Hitachi) / Yuuki Kobayashi(NEC) / Hiroki Nakahara(Tokyo Inst. of Tech.) / Tetsuya Hirose(Osaka Univ.) / Koji Nii(Floadia) / Takeshi Kuboki(Kyushu Univ.) / Kyohei Unno(KDDI Research) / Norishige Fukushima(Nagoya Inst. of Tech.) |
| Paper Information | |
| Registration To | Technical Committee on VLSI Design Technologies / Technical Committee on Dependable Computing / Technical Committee on Computer Systems / Technical Committee on Reconfigurable Systems / Technical Committee on Integrated Circuits and Devices / Technical Committee on Image Engineering / Special Interest Group on System and LSI Design Methodology / Special Interest Group on Embedded Systems / Special Interest Group on System Architecture |
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| Language | JPN |
| Title (in Japanese) | (See Japanese page) |
| Sub Title (in Japanese) | (See Japanese page) |
| Title (in English) | Mask Optimization Considering Process Variation by Subgradient Method |
| Sub Title (in English) | |
| Keyword(1) | optical lithography |
| Keyword(2) | mask optimization |
| Keyword(3) | Optical Proximity Correction (OPC) |
| Keyword(4) | subgradient method |
| Keyword(5) | Lagrangean relaxation method |
| 1st Author's Name | Yukihide Kohira |
| 1st Author's Affiliation | The University of Aizu(Univ. of Aizu) |
| 2nd Author's Name | Rina Azuma |
| 2nd Author's Affiliation | The University of Aizu(Univ. of Aizu) |
| 3rd Author's Name | Tomomi Matsui |
| 3rd Author's Affiliation | Tokyo Institute of Technology(Tokyo Tech) |
| 4th Author's Name | Atsushi Takahashi |
| 4th Author's Affiliation | Tokyo Institute of Technology(Tokyo Tech) |
| 5th Author's Name | Chikaaki Kodama |
| 5th Author's Affiliation | KIOXIA Corporation(KIOXIA) |
| Date | 2019-11-15 |
| Paper # | VLD2019-53,DC2019-77 |
| Volume (vol) | vol.119 |
| Number (no) | VLD-282,DC-283 |
| Page | pp.pp.197-202(VLD), pp.197-202(DC), |
| #Pages | 6 |
| Date of Issue | 2019-11-06 (VLD, DC) |